首页> 外国专利> FERROELECTRIC THIN-FILM STRUCTURES, METHODS OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICES INCLUDING THE FERROELECTRIC THIN-FILM STRUCTURES

FERROELECTRIC THIN-FILM STRUCTURES, METHODS OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICES INCLUDING THE FERROELECTRIC THIN-FILM STRUCTURES

机译:铁电薄膜结构,制造方法的方法,以及包括铁电薄膜结构的电子设备

摘要

A ferroelectric thin-film structure includes at least one first atomic layer and at least one second atomic layer. The first atomic layer includes a first dielectric material that is based on an oxide, and the second atomic layer includes both the first dielectric material and a dopant that has a bandgap greater than a bandgap of the dielectric material.
机译:铁电薄膜结构包括至少一个第一原子层和至少一个第二原子层。第一原子层包括基于氧化物的第一介电材料,第二原子层包括第一介电材料和掺杂剂,该掺杂剂具有大于介电材料的带隙的带隙。

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