首页> 外国专利> METHOD AND DEVICE FOR EVALUATING A STATISTICALLY DISTRIBUTED MEASURED VALUE IN THE EXAMINATION OF AN ELEMENT OF A PHOTOLITHOGRAPHY PROCESS

METHOD AND DEVICE FOR EVALUATING A STATISTICALLY DISTRIBUTED MEASURED VALUE IN THE EXAMINATION OF AN ELEMENT OF A PHOTOLITHOGRAPHY PROCESS

机译:用于评估统计上分布的测量值的方法和装置在检查光刻过程的元件中

摘要

The present invention relates to a method for evaluating a statistically distributed measured value in the examination of an element for a photolithography process, comprising the following steps: (a) using a plurality of parameters in a trained machine learning model, wherein the parameters characterize a state of a measurement environment in a time period assigned to a measurement of the measured value; and (b) executing the trained machine learning model in order to evaluate the measured value.
机译:本发明涉及一种用于评估用于检查光刻过程的元件的统计上分布测量值的方法,包括以下步骤:(a)在培训的机器学习模型中使用多个参数,其中参数表征了一个在分配给测量值的测量的时间段内的测量环境的状态; (b)执行培训的机器学习模型以评估测量值。

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