首页> 外国专利> Removable opaque coating for accurate optical topography measurements on top surfaces of transparent films

Removable opaque coating for accurate optical topography measurements on top surfaces of transparent films

机译:可拆卸的不透明涂层,用于精确的光学形貌测量在透明薄膜的顶面上测量

摘要

A method of using removable opaque coating for accurate optical topography measurements on top surfaces of transparent films includes: depositing a highly reflective coating onto a top surface of a wafer, measuring topography on the highly reflective coating, and removing the highly reflective coating from the wafer. The highly reflective coating includes an organic material. The highly reflective coating comprises a refractive index value between one and two. The highly reflective coating comprises a complex wavelength greater than one at six-hundred and thirty-five nanometers. The highly reflective coating reflects at least twenty percent of incident light. The highly reflective coating when deposited maintains an underlayer pattern topography at a resolution of forty by forty micrometers. The highly reflective coating does not cause destructive stress to the wafer.
机译:一种用于在透明膜的顶表面上进行可拆卸不透明涂层的方法,包括:将高反射涂层沉积到晶片的顶表面上,测量高反射涂层上的形貌,并从晶片中除去高反射涂层。高反射涂层包括有机材料。高反射涂层包括折射率值,在一个和两个之间。高反射涂层包括大于六百至35纳米的复杂波长。高反射涂层反映了至少20%的入射光。在沉积时高反射涂层以四十微米的分辨率保持底层图案形貌。高反射涂层不会对晶片造成破坏性应力。

著录项

  • 公开/公告号US11049720B2

    专利类型

  • 公开/公告日2021-06-29

    原文格式PDF

  • 申请/专利权人 KLA CORPORATION;

    申请/专利号US201916597131

  • 申请日2019-10-09

  • 分类号H01L21/027;B82Y20;G03F7/09;H01L21/66;G01B11/24;

  • 国家 US

  • 入库时间 2022-08-24 19:38:34

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