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Underpotential deposition apparatus installed with rotating electrode which has Particulate matter immobilizing filter module
Underpotential deposition apparatus installed with rotating electrode which has Particulate matter immobilizing filter module
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机译：安装具有旋转电极的轴向沉积装置，其具有固定过滤器模块的颗粒物质
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摘要
The present invention discloses a low-potential plating apparatus to which a fixed-type rotary electrode for particulate matter is applied to remove particulate matter contained in a solution accommodated in the low-potential plating apparatus. The low-potential plating apparatus to which the particulate matter-fixed rotating electrode according to an embodiment of the present invention is applied is a frame coupled to the side of the working electrode extending in the longitudinal direction inside the reaction chamber, while rotating along the working electrode. a first filter through which the solvent contained in the injected solution is passed through, and provided with a mesh for adsorbing particulate matter contained in the solution; a second filter installed under the first filter to be spaced apart from the first filter, a frame coupled to the inner wall of the reaction chamber, and a mesh for adsorbing particulate matter desorbed from the first filter while the first filter rotates; a motor for transmitting rotational force to the working electrode; and a control unit that generates a driving force in the motor to control the rotation of the working electrode, wherein, in the first filter, one surface of the frame is an open surface in which the installation of the mesh is omitted.
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