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Bar taper type polishing device and same polishing method

机译:条锥形抛光装置和相同的抛光方法

摘要

Problem to be solved: to provide a polishing apparatus suitable for polishing a rod material made of a material which is susceptible to damage such as cracking or cracking.Solution: a pair of abrasive members 3 and 3 facing each other with a symmetrical inclination with respect to the center axis X of the rod material 2 to be polished, and a rotation drive mechanism 4 for rotating at least one of the pair of abrasive members 3 and 3 and the rod material 2 with respect to the center axis X of the rod member 2 as a center The press propulsion mechanism 5 for pressing the pair of abrasive members 3 and 3 and the rod member 2 is provided.Diagram
机译:要解决的问题:提供一种适用于抛光由易受抗裂或裂纹损坏的材料制成的杆材料的抛光设备。溶解:一对磨料构件3和3面对对称的倾斜度 待抛光的杆材料2的中心轴X,以及旋转驱动机构4,用于相对于杆构件的中心轴线X旋转一对磨料构件3和3中的至少一个和杆材料2 如图2所示,提供了用于压制一对磨料构件3和3的压力推进机构5和杆构件2 .Diagram

著录项

  • 公开/公告号JP2021171872A

    专利类型

  • 公开/公告日2021-11-01

    原文格式PDF

  • 申请/专利权人 三共理化学株式会社;

    申请/专利号JP20200077137

  • 发明设计人 入交 俊輔;

    申请日2020-04-24

  • 分类号B24B19/16;B24B21;

  • 国家 JP

  • 入库时间 2022-08-24 22:01:16

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