首页> 外国专利> - HALOGEN FREE SYNTHESES OF AMINOSILANES BY CATALYTIC DEHYDROGENATIVE COUPLING

- HALOGEN FREE SYNTHESES OF AMINOSILANES BY CATALYTIC DEHYDROGENATIVE COUPLING

机译:- 通过催化脱氢偶联的氨基硅烷的无卤合成

摘要

Compounds of Si-X and Ge-X compounds (X = N, P, As and Sb) via dehydrogenation coupling between the corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metallic catalysts and methods of making the same. This novel approach is based on the catalytic dehydrogenation coupling of Si-H and X-H moieties to form Si-X containing compounds and hydrogen gas (X = N, P, As and Sb). The process can be catalyzed by transition metal heterogeneous catalysts such as Ru(0)/C, Pd(O)/MgO and transition metal organometallic complexes acting as homogeneous catalysts. The -Si-X product prepared by dehydrogenation coupling is essentially halogen-free. The compounds may be useful for deposition of thin films by chemical vapor deposition of Si-containing films or by atomic layer deposition.
机译:通过相应的未取代硅烷和胺(包括氨)与金属催化剂催化的胺(包括氨)和磷酸酯的脱氢偶联,通过脱氢偶联和制造相同方法的方法,Si-X和Ge-X化合物(X = N,P,AS和Sb)和制造方法。 这种新方法基于Si-H和X-H部分的催化脱氢偶联,形成含Si-X的化合物和氢气(X = N,P,AS和Sb)。 该方法可以通过过渡金属异质催化剂,例如Ru(0)/ C,Pd(O)/ MgO和过渡金属有机金属配合物作为均相催化剂的过渡金属异质催化剂催化。 通过脱氢偶联制备的-Si-X产品基本上是无卤的。 该化合物可用于通过含Si膜的化学气相沉积或通过原子层沉积沉积薄膜。

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