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首页> 外国专利> A measuring device for determining the distance between the laser processing head and the work, a laser processing system equipped with this measuring device, and a method for determining the distance between the laser processing head and the work.

A measuring device for determining the distance between the laser processing head and the work, a laser processing system equipped with this measuring device, and a method for determining the distance between the laser processing head and the work.

机译：一种用于确定激光加工头和工作之间的距离的测量装置，一种配备有该测量装置的激光加工系统，以及用于确定激光加工头和工作之间的距离的方法。

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摘要

The present disclosure is a measurement for determining the distance between a processing head (101) of a laser processing system (100) configured to process a work (1) using a laser beam (10) and the work. Regarding the device. The measuring device comprises an optical coherence tomography (120) configured to measure the distance between the processing head (101) and the work (1). In the optical interference tomometer (120), the measurement light (13) generated by the measurement light source and reflected by the workpiece (1) is reflected by the reference arm (200, 300) having two or more reference stages. Interferes with light. The two or more reference stages are a first reference stage (210) and a second reference stage configured such that the measurement light reflected in the first reference stage (210) travels along the first optical path length. It includes a second reference stage (220) configured such that the measured light reflected in (220) travels a second optical path length different from the first optical path length. The measurement light reflected by the work (1) interferes with the reflected measurement light of the first reference stage (210) and the reflected measurement light of the second reference stage (220).
机译：本公开是用于确定激光处理系统（100）的处理头（101）之间的距离，用于使用激光束（10）和所述工作来处理所述工作（1）的处理系统（100）之间的距离。关于设备。测量装置包括光学相干断层扫描（120），其被配置为测量处理头（101）和工作（1）之间的距离。在光学干涉性能计（120）中，由测量光源产生并由工件（1）反射的测量光（13）由具有两个或更多个参考阶段的参考臂（200,300）反射。干扰光线。两个或更多个参考阶段是第一参考级（210）和第二参考级，其构造成使得在第一参考级（210）中反射的测量光沿第一光路长度行进。它包括第二参考级（220），其被配置为使得在（220）中反射的测量光行进与第一光路长度不同的第二光路长度。由工作（1）反射的测量光干扰了第一参考级（210）的反射测量光和第二参考级（220）的反射测量光。

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