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首页> 外文会议>18th Symposium on Microelectronics Technology and Devices; 16th Symposium on Integrated Circuits and System Design; Sep 8-11, 2003; Sao Paulo, Brazil >INFLUENCE OF RF FREQUENCY ON PRODUCTION OF ADSORBENT ORGANIC FILMS BY PECVD
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INFLUENCE OF RF FREQUENCY ON PRODUCTION OF ADSORBENT ORGANIC FILMS BY PECVD

机译：射频频率对PECVD生产吸附性有机薄膜的影响

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摘要

The effect of the frequency of the plasma power supply used to obtain organic thin film was studied using 13.56 MHz. Two types of reactor were used: a) a tubular one and b) a capacitive parallel plate one. The precursor reagents used in the deposition process were 2-propanol, acetone, ethyl ether and hexamethyldisilazane. The films were deposited on silicon wafer and piezoelectric quartz crystal. The characterization of the films was done by infrared, optical microscopy and contact angle formed by drops of water and 2-propanol aqueous solution. The results were compared to the films obtained previously with a reactor with power supply of 40 kHz. The experiments showed that it was possible to deposit film of HMDS using both types, but acetone was possible to deposit only in capacitive parallel plate reactor and 2-propanol film was obtained using tubular reactor. FTIR analyses showed CH_3, CH_2 and eventually OH bands.
机译：使用13.56 MHz研究了用于获得有机薄膜的等离子体电源的频率的影响。使用两种类型的反应器：a）管状反应器，b）电容平行板。沉积过程中使用的前体试剂是2-丙醇，丙酮，乙醚和六甲基二硅氮烷。将膜沉积在硅晶片和压电石英晶体上。通过红外，光学显微镜和由水滴和2-丙醇水溶液形成的接触角对薄膜进行表征。将结果与先前使用电源为40 kHz的电抗器获得的薄膜进行比较。实验表明，两种类型都可以沉积HMDS膜，但是丙酮仅可以在电容平行板反应器中沉积，而使用管式反应器则可以得到2-丙醇膜。 FTIR分析显示CH_3，CH_2和最终的OH带。

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