Sputtering of ZnO:Ga thin films with the inclined crystalic texture

机译：溅射具有倾斜晶体织构的ZnO：Ga薄膜

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In this paper the possibility to form thin films with the inclined crystalic texture by the RF diode sputtering is presented. Two oblique deposition arrangements were used for the preparation of ZnO:Ga thin films with the deviation of their columnar structures in the range of 12 ÷ 15 deg to the substrate normal, i.e. an inclination of their ordinary optical axis. The inclined texture of films has changed their optical transmittance spectra as well as it caused the blue-shift and the change of the optical band-gap.

机译：在本文中，提出了通过射频二极管溅射形成具有倾斜晶体织构的薄膜的可能性。使用两种倾斜沉积装置制备ZnO：Ga薄膜，其柱状结构相对于基板法线的偏离范围为12÷15度，即其普通光轴的倾斜度。薄膜的倾斜质地改变了它们的光透射光谱，并引起了蓝移和光学带隙的变化。

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《2010 27th International Conference on Microelectronics Proceedings》|2010年|p.177-180|共4页
会议地点 Nis(RS);Nis(RS)
作者
Tvarozek V.; Novotny I.; Sutta P.; Netrvalova M.; Flickyngerova S.; Spiess L.; Schaaf P.;
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Department of Microelectronics, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, Slovakia;

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正文语种 eng
中图分类微模组件;
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2. Surface textured MF-sputtered ZnO films for microcrystalline silicon-based thin-film solar cells [J] . Hupkes J, Rech B, Kluth O, Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2006,第18a19期

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3. Surface textured ZnO:Al thin films by pulsed DC magnetron sputtering for thin film solar cells applications [J] . W.T.Yen, Y.C.Lin, J.H.Ke Applied Surface Science . 2010,第3期

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4. Sputtering of ZnO:Ga Thin Films with the Inclined Crystalic Texture [C] . V. Tvarozek, I. Novotny, P. Sutta, International Conference on Microelectronics . 2010

机译：ZnO的溅射：Ga薄膜，倾斜的晶体纹理
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Sputtering of ZnO:Ga thin films with the inclined crystalic texture

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