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FILM-FORMING METHOD OF CRYSTALLINE ZNO SYSTEM TRANSPARENT CONDUCTIVE THIN FILM, CRYSTALLINE ZNO SYSTEM TRANSPARENT CONDUCTIVE THIN FILM AND FILM, AS WELL AS RESISTANCE FILM TYPE TOUCH PANEL
FILM-FORMING METHOD OF CRYSTALLINE ZNO SYSTEM TRANSPARENT CONDUCTIVE THIN FILM, CRYSTALLINE ZNO SYSTEM TRANSPARENT CONDUCTIVE THIN FILM AND FILM, AS WELL AS RESISTANCE FILM TYPE TOUCH PANEL
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机译：结晶Zno系统的透明导电薄膜的成膜方法，结晶Zno系统的透明导电薄膜和电阻膜型触摸屏
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摘要
PROBLEM TO BE SOLVED: To provide a film-forming method of a crystalline ZnO system transparent conductive thin film 12 with extremely small changes with the passage of time in the resistance value change on a low-temperature or non-heated substrate 11 in a single cathode pulse sputtering method or a dual cathode pulse sputtering method.;SOLUTION: This is the film-forming method of the crystalline ZnO based transparent conductive thin film in which the duty ratio of impressing power impressed on a target electrode is made 60% or less in the film-forming method of the ZnO based transparent conductive thin film by a single cathode pulse sputtering method, or the duty ratio of the impressing power impressed respectively on the two target electrodes is made 40% or less in the film-forming method of the ZnO based transparent conductive thin film by a dual cathode pulse sputtering method.;COPYRIGHT: (C)2008,JPO&INPIT
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