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Dielectric response of ferroelectric thin films with full and partial depletion

机译:完全耗尽和部分耗尽的铁电薄膜的介电响应

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摘要

We studied the dielectric response of metal/ferroelectric/metal thin films capacitors with low to moderate densities of n-type impurities. Using the Landau-Ginzburg-Devonshire formalism for ferroelectrics, equations of semiconductors and electrostatics, we show how partially depleted films can generate a higher dielectric constant than those fully depleted but having the same impurity density. Such a thickness dependence trend is just the inverse of what is expected from films with low or no impurities. The results are provided for (001) BaTiO3 films grown on (001) SrTiO3 substrates with pseudomorphic Pt top and bottom metallic electrodes.
机译:我们研究了具有低至中等密度n型杂质的金属/铁电/金属薄膜电容器的介电响应。将Landau-Ginzburg-Devonshire形式主义用于铁电体,半导体和静电方程,我们展示了部分耗尽的膜如何比完全耗尽但具有相同杂质密度的膜产生更高的介电常数。这种厚度依赖性趋势恰好与杂质少或无杂质的薄膜相反。提供了在具有假晶Pt顶部和底部金属电极的(001)SrTiO3衬底上生长的(001)BaTiO3膜的结果。

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