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Experimental evaluation of mismatching on the analog characteristics of GC SOI MOSFETs

机译:GC SOI MOSFET的模拟特性不匹配的实验评估

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摘要

This paper presents an experimental study of mismatching on the analog characteristics of fully-depleted graded-channel SOI MOSFET in comparison to uniformly doped transistors. The study is carried out using dedicated structures to account for the mismatch that have been fabricated at the same chip and with the same technology. Important basic parameters such as threshold voltage and subthreshold slope were analyzed as well as analog parameters, namely transconductance, output conductance, Early voltage and intrinsic voltage gain.
机译:与均匀掺杂的晶体管相比,本文提出了对完全耗尽的渐变沟道SOI MOSFET的模拟特性不匹配的实验研究。该研究是使用专用结构来解决的,以解决在同一芯片上使用相同技术制造的不匹配问题。分析了重要的基本参数,例如阈值电压和亚阈值斜率,以及模拟参数,即跨导,输出电导,早期电压和固有电压增益。

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