Particle Performance of Modified SC-1 Solutions

机译：改进的SC-1解决方案的粒子性能

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The RCA clean is widely used in the semiconductor industry for many wet-chemical cleaning processes. The RCA clean consists of a particle removal step, the Standard Clean 1 or SC-1 followed by a metallic contamination removal step, the Standard Clean 2 or SC-2 step. We have investigated the addition of chelating agents and surfactants in SC-1 solutions to provide an "all-in-one" single step cleaning solution. In this work we will focus on the effect of surfactants in such solutions for sub-micron particle removal.

机译：RCA clean在半导体工业中广泛用于许多湿化学清洁工艺。 RCA清洁包括颗粒去除步骤，标准清洁1或SC-1，然后是金属污染物去除步骤，标准清洁2或SC-2步骤。我们已经研究了在SC-1溶液中添加螯合剂和表面活性剂以提供“多合一”一步清洁溶液的方法。在这项工作中，我们将重点研究表面活性剂在此类溶液中对亚微米颗粒去除的作用。

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来源
《22nd Annual Semiconductor Pure Water and Chemicals Conference Feb 17-19, 2003 Santa Clara, CA》|2003年|p.84-90|共7页
会议地点 Santa Clara CA(US)
作者
Christopher Beaudry; Jennifer Baker; Steven Verhaverbeke;
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作者单位

Wet Clean Division, Applied Materials, Santa Clara, CA, USA;

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原文格式 PDF
正文语种 eng
中图分类化学工业;
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Particle Performance of Modified SC-1 Solutions

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