首页> 外文会议>2nd EOS conference on manufacturing of optical components 2011 >Specific exposure and photochemistry on dissolvable 3D-PMMA microoptical masters with resist surface grating
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Specific exposure and photochemistry on dissolvable 3D-PMMA microoptical masters with resist surface grating

机译:具有抗蚀剂表面光栅的可溶解3D-PMMA微光学原版的特定曝光和光化学

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摘要

A set of shaping, photochemical and interferogram exposure processes opens the way to the origination of high geometrical quality 3D microoptic element with diffractive faces allowing a damageless separation between nickel shim of concave geometry and the master by chemical dissolution of the latter.
机译:一系列的成形,光化学和干涉图曝光工艺为具有几何形状的高几何质量3D微光学元件的产生开辟了道路,从而通过化学溶解使凹形几何形状的镍垫片与母盘之间无损分离。

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  • 来源
  • 会议地点 Munich(DE);Munich(DE)
  • 作者单位

    University of Lyon, Lab. H. Curien UMR CNRS 5516, 42000 Saint-Etienne, France;

    University of Lyon, Lab. H. Curien UMR CNRS 5516, 42000 Saint-Etienne, France;

    Karlsruhe Institute of Technology, 76344 Karlsruhe, Germany;

    Karlsruhe Institute of Technology, 76344 Karlsruhe, Germany;

    Karlsruhe Institute of Technology, 76344 Karlsruhe, Germany;

    Institute of Micromechanics and Photonics, 02-525 Warsaw, Poland;

    Institute of Micromechanics and Photonics, 02-525 Warsaw, Poland;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学仪器;
  • 关键词

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