Sinusoidally modulated reference artefacts for calibration of surface texture measuring instruments

机译：用于表面纹理测量仪器校准的正弦调制参考伪像

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As part of a collaborative project, Sinusoidally modulated gratings with periods in the range of 0.8 to 25 μm have been developed at the National Physical Laboratory (NPL). The gratings are formed in photoresist-coated substrates by exposing them to an optical interference pattern. The photoresist gratings are then replicated into electroformed nickel. The gratings are measured using the NanoSurf IV instrument and the measured data are analysed using mathematical algorithms developed at NPL. The gratings can be used to calibrate surface texture measuring instruments.

机译：作为合作项目的一部分，国家物理实验室（NPL）已开发出周期范围为0.8至25μm的正弦调制光栅。通过将光栅暴露于光学干涉图样而在涂覆有光刻胶的衬底中形成光栅。然后将光致抗蚀剂光栅复制到电铸镍中。使用NanoSurf IV仪器测量光栅，并使用NPL开发的数学算法分析测量数据。光栅可用于校准表面纹理测量仪器。

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来源
《2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy》|2001年|p.414-417|共4页
会议地点 Turin(IT)
作者
R. Leach; I. Garbutt; P. Harris; M. Cox;
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作者单位

National Physical Laboratory, Teddington, UK;

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原文格式 PDF
正文语种 eng
中图分类机械、仪表工业;
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Sinusoidally modulated reference artefacts for calibration of surface texture measuring instruments

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