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首页> 外文会议>2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy >GAIA OPD Testbench Interferometer with tens of picometre accuracy
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GAIA OPD Testbench Interferometer with tens of picometre accuracy

机译：GAIA OPD Testbench干涉仪，精度达数十皮

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摘要

A test-bench simulating the GAIA metrology system has been developed and tested at TNO TPD. The lines-of-sight of the two telescopes in the GAIA instrument are separated by an angle (called "basic angle") of about 106 degrees. The basic angle stability should be within 10 microarcsecond rms over the satellite revolution period of 3 hours, or has to be known with this accuracy. The basic angle is monitored by an interferometric metrology system. The stability of the test-bench must be in the range of tens of picometres. Optical path length changes as small as 40 picometre have been measured, with an accuracy of 15 picometre; this is equivalent to an accuracy of 5 microarcsecond for the measurement of GAIA's basic angle.
机译：在TNO TPD上已经开发并测试了模拟GAIA计量系统的测试台。 GAIA仪器中两个望远镜的视线之间相隔约106度的角度（称为“基本角度”）。在3小时的卫星旋转周期内，基本角度稳定性应在10微弧度rms以内，或者必须以这种精度知道。基本角度由干涉测量系统监控。测试台的稳定性必须在几十皮米的范围内。测量的光程长度变化小至40皮米，精度为15皮米；这相当于GAIA基本角的测量精度为5微秒。

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