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首页> 外文会议>3rd EOS conference on manufacturing of optical components 2013 >Interferometric testing of optical angular scales and structures
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Interferometric testing of optical angular scales and structures

机译：光学角度标尺和结构的干涉测量

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The application of a Fizeau interferometer for quality check of angular scales, optical limbs, raster etc. fabricated by means of precision laser writer system CLWS-300IAE is discussed. Computer simulation and experimental results are presented. One of the promising fabrication technology of high-precision optical angular scales (OAS) for rotary encoder is direct laser writing with circular scanning, implemented on CLWS-300. Operational control of manufacturing precision is necessary for the successful implementation of this method. Currently, testing OAS with accuracy of 0.1 arcsec can be achieved only in the metrological centers. Obviously, it restrains practical application of this method. In this paper, we propose to use a standard Fizeau interferometer for operational control of OAS quality. An important feature of CLWS-300 is the ability to fabricate OAS and arbitrary diffraction structures in a single process. In this case, the linear diffraction grating (DG) and OAS have the same fabrication errors. Linear DGs wavefront distortion can be interferometrically tested in reflection under Littrow angle (Fig.1a). At the presence of writing errors, distortions of the interference pattern can be observed (Fig. 1b). Analyzing these distortions along a ring with radius R gives the values of wavefront distortion directly lead to the angular error. The angular error ε of the CLWS-300 can be calculate by ΔW～mεR/Tλ, where ΔW is the wavefront error, m is diffraction order, T is the spacing of the DG and λ is wavelength. For the parameters m=5, ε=1 arc. sec., R=20 mm, 7=2 μm we observed distortions ΔW ～ 0.025 λ (Fig.1c).
机译：讨论了Fizeau干涉仪在通过精密激光写入系统CLWS-300IAE制作的角标尺，光学肢体，光栅等的质量检查中的应用。给出了计算机仿真和实验结果。用于旋转编码器的高精度光学角标（OAS）的有前途的制造技术之一是在CLWS-300上实现的带圆形扫描的直接激光写入。要成功实施此方法，必须对制造精度进行操作控制。目前，仅在计量中心就可以实现精度为0.1 arcsec的OAS测试。显然，它限制了该方法的实际应用。在本文中，我们建议使用标准的Fizeau干涉仪对OAS质量进行操作控制。 CLWS-300的一个重要特征是能够在单个过程中制造OAS和任意衍射结构。在这种情况下，线性衍射光栅（DG）和OAS具有相同的制造误差。线性DGs的波前畸变可以在Littrow角的反射下进行干涉测量（图1a）。在存在写入错误的情况下，可以观察到干涉图案的扭曲（图1b）。分析沿半径为R的圆环的这些畸变可以得出波前畸变的值直接导致角度误差。 CLWS-300的角度误差ε可以通过ΔW〜mεR/Tλ来计算，其中ΔW是波前误差，m是衍射级，T是DG的间距，λ是波长。对于参数m = 5，ε= 1弧。秒，R = 20mm，7 =2μm，我们观察到了变形ΔW〜0.025λ（图1c）。

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