High-NA EUV projection lens with central obscuration

机译：高NA EUV投影镜头，带中央遮蔽

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EUV projection lens consisting of four coaxial mirrors with a Numerical Aperture of 0.485 and a twelve-fold demagnification has been developed. According to the computation the circuit features at 10 nm in center and 20 nm on the edge of 12.4 mm field of view can be imaged. The scheme of the projection lens with such demagnification promotes the production of the defect-less masks and reduction of their cost.

机译：已开发出由四个同轴镜构成的EUV投影透镜，其数值孔径为0.485，放大倍数为12倍。根据计算，可以对中心10 nm处和12.4 mm视场边缘处20 nm处的电路特征进行成像。具有这种缩小倍率的投影透镜的方案促进了无缺陷掩模的生产并降低了其成本。

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来源
《3rd EOS conference on manufacturing of optical components 2013》|2013年|69-70|共2页
会议地点 Munich(DE)
作者
A.P. Zhevlakov; A.A. Bagdasarov; R.P. Seysyan;
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作者单位

Institute for Laser Physics Vavilov State Optical Institute, St-Petersburg, Russia;

Institute for Laser Physics Vavilov State Optical Institute, St-Petersburg, Russia;

Ioffe Physic-Technical Institute RAS, St-Petersburg, Russia;

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专利

1. Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node [J] . Yeung Michael, Barouch Eytan, Oh Hye-Keun Japanese journal of applied physics . 2015,第6S1期

机译：高NA EUV光刻中的波导效应：将EUV光刻扩展到4 nm节点的关键
2. EUV LITHOGRAPHY: High-NA EUV optics are on their way [J] . John Wallace Laser Focus World: The Magazine for the Photonics & Optoelectronics Industry . 2013,第7期

机译：EUV光刻：高NA EUV光学器件正在发展中
3. Imec demonstrates 20nm pitch line/space resist imaging with high-NA EUV interference lithography [J] . European Semiconductor . 2021,第1期

机译：IMEC演示了具有高NA EUV干扰光刻的20nm间距线/空间抗蚀剂成像
4. High-NA EUV projection lens with central obscuration [C] . A.P. Zhevlakov, R.P. Seisyan, V.G. Bespalov, Extreme ultraviolet (EUV) lithography VII . 2016

机译：高NA EUV投影镜头，带中央遮蔽
5. Evaluation of the thermal design of a liquid-lens cooling system for projection picture tubes. [D] . Lamas, Jose Angel. 2002

机译：投影显像管液镜冷却系统的热设计评估。
6. High-NA two-photon single cell imaging with remote focusing using a diffractive tunable lens [O] . Molly A. May, Martin Bawart, Michiel Langeslag, 2020

机译：使用衍射可调镜头的高Na双光子单细胞成像远程聚焦
7. Lateral shearing interferometry for high-NA EUV wavefront metrology [O] . Wenhua Zhu, Ryan H. Miyakawa, Patrick Naulleau, 2018

机译：高NA EUV波前计量的侧剪剪切干涉测量
8. SEMATECH High-NA Actinic Reticle Review Project (SHARP) EUV Mask-Imaging Microscope. [R] . Mochi, I., Benk, M. P., Lin, C., 2013

机译：sEmaTECH High-Na光化学光罩检查项目（sHaRp）EUV面罩成像显微镜。

High-NA EUV projection lens with central obscuration

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