EFFECT OF SUBSTRATE PREPARATION ON WETTING IN Al-TiN SYSTEM

机译：基质制备对Al-TiN体系润湿的影响

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The wetting behavior of Al and AlSill alloy against TiN substrates of different surface structure was studied by a sessile drop method at 1073-1173K for 2h in a vacuum of 0.1 mPa. The data of contact angle measurements were analyzed taking into account the initial roughness of TiN substrates and the effect of alloying on the structure of the reaction product region.

机译：采用固着法在1073-1173K，0.1 mPa真空下研究了Al和AlSill合金对不同表面结构的TiN衬底的润湿行为。考虑到TiN衬底的初始粗糙度以及合金化对反应产物区域结构的影响，对接触角测量数据进行了分析。

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来源
《3rd International Conference on High Temperature Capillarity HTC-2000, 3rd, Nov 19-22, 2000, Kurashiki, Japan》|2000年|p.173-178|共6页
会议地点 Kurashiki(JP);Kurashiki(JP)
作者
Natalia SOBCZAK; Krystyna PIETRZAK; Andrzej WOJCIECHOWSKI; Waldemar RADZIWILL; Marzanna KSIAZEK; Ludoslaw STOBIERSKI;
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Foundry Research Institute, 73 Zakopianska St., 30-418 Cracow, POLAND;

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原文格式 PDF
正文语种 eng
中图分类化学;
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EFFECT OF SUBSTRATE PREPARATION ON WETTING IN Al-TiN SYSTEM

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