首页> 外文会议>The 41st IEEE International Conference on Plasma Science, and the 20th International Conference on High-Power Particle Beams >Large volume penning plasma discharge source: An efficient light emitting source for the visible and VUV radiations simultaneously
【24h】

Large volume penning plasma discharge source: An efficient light emitting source for the visible and VUV radiations simultaneously

机译:大容量笔式等离子体放电源:同时用于可见光和VUV辐射的高效发光源

获取原文

摘要

In the applications of light emitting sources it has recently been proposed that a penning plasma discharge device can be used to calibrate a VUV spectrometer-detector system which will be an easy and low cost method in comparison to the commonly known branching ratio method used in Tokamak plasmas. In this paper a large volume penning discharge source as an efficient light emitting source for both the visible and VUV radiation simultaneously is reported. Two different anode geometries have been developed for light efficiency analysis, which includes rectangular anode and double anode rings. The experiments have been performed for different working pressures, admixture of gases and discharge voltages. The developed source is able to produce large number of spectral lines in the shorter wavelengths of VUV range from the buffer gases and not by electrode materials as compared to other sources. The images of the ICCD camera are used to understand the emission pattern, and the diffusion of plasma for different exposure times with different experimental conditions, each of which exhibiting an unlike spatial emission pattern. The emission pattern of double ring shows bright discharge region at the center as compared to the rectangular configuration. Simulations have also been carried out using OMNI Track and VORPAL particle-in-cell simulation codes to perceive the particle trajectories from the electric field profile and potential distribution of the developed configurations. The intensity variation of the observed spectral lines shows that the visible and VUV spectral line intensities are more sensitive at higher working pressures and gives higher emission in double ring configuration. The present study suggest that the double ring configuration penning plasma discharge source is a better source for VUV-spectrometer detector system calibration application.
机译:在发光源的应用中,最近提出了一种可插入的等离子体放电装置可用于校准VUV光谱仪-检测器系统,与托卡马克中使用的通常已知的分支比率方法相比,这将是一种简便且低成本的方法。血浆。在本文中,报道了大体积的笔形放电源作为同时用于可见光和VUV辐射的有效发光源。已经开发出两种不同的阳极几何形状用于光效率分析,包括矩形阳极和双阳极环。已经针对不同的工作压力,气体混合物和放电电压进行了实验。与其他来源相比,开发的来源能够从缓冲气体中以较短的VUV波长波长产生大量光谱线,而不是由电极材料产生。 ICCD摄像机的图像用于了解发射模式以及在不同实验条件下不同曝光时间下等离子体的扩散情况,每个实验条件都显示出不同的空间发射模式。与矩形结构相比,双环的发射图案在中央显示出明亮的放电区域。还使用OMNI Track和VORPAL单元内粒子模拟代码进行了模拟,以从电场轮廓和已开发配置的电势分布中感知粒子轨迹。观察到的光谱线的强度变化表明,可见光和VUV光谱线的强度在较高的工作压力下更为敏感,并且在双环配置下具有较高的发射率。本研究表明,双环配置的等离子体放电源是用于VUV光谱仪探测器系统校准应用的更好的光源。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号