VITREOUS CARBON MEMBRANE X-RAY MASKS FOR LIGA PROCESS

机译：LIGA工艺的玻璃碳膜X射线面膜

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X-ray masks consist of absorber patterns supported by highly X-ray transparent thin membranes or thick substrates. For thin membrane materials, titanium and silicon compound membranes have a high X-ray transparency but are expensive, difficult to handle and have small pattern areas. For thick substrates like beryllium, silicon or graphite, it is easy to get large pattern areas, but the potential toxicity of beryllium, high X-ray absorbance of silicon and high porosity of graphite are limitations. The focus of this research effort was to fabricate masks which are cost effective like graphite masks and also can produce high pattern quality like Ti masks by using vitreous carbon as membrane material.

机译：X射线掩模由高X射线透明薄膜或厚基板支撑的吸收体图案组成。对于薄膜材料，钛和硅复合膜具有较高的X射线透明性，但价格昂贵，难以处理且图案面积小。对于诸如铍，硅或石墨的厚衬底，很容易获得较大的图案区域，但是铍的潜在毒性，硅的高X射线吸收率和石墨的高孔隙度是局限性。这项研究工作的重点是制造成本低廉的掩模（如石墨掩模），并且还可以通过使用玻璃碳作为膜材料来生产高品质的图案（如Ti掩模）。

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来源
《8th International conference on commercialization of micro and nano systems (COMS 2003)》|2003年|151-154|共4页
会议地点 Amsterdam(NL);Amsterdam(NL)
作者
Linke Jian; Bernd Loechel; Heinz-Ulrich Scheunemann; Martin Bednarzik; Alexandre Firsov;
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Application Center for Microengineering, BESSY GmbH, Albert-Einstein-Str.15, 12489 Berlin, Germany LinkeJian.bessv.de, phone: +49 30 632 5012, fax: +49 30 6392 4682;

rnApplication Center for Microengineering, BESSY GmbH, Albert-Einstein-Str.15, 12489 Berlin, Germany;

rnApplication Center for Microengineering, BESSY GmbH, Albert-Einstein-Str.15, 12489 Berlin, Germany;

Application Center for Microengineering, BESSY GmbH, Albert-Einstein-Str.15, 12489 Berlin, Germany;

Application Center for Microengineering, BESSY GmbH, Albert-Einstein-Str.15, 12489 Berlin, Germany;

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专利

1. Equations of exposure time and X-ray mask absorber thickness in the LIGA process [J] . K. H. Gil, S. S. Lee, Y. Youm Microsystem technologies . 2001,第1期

机译：LIGA工艺中的曝光时间和X射线掩模吸收体厚度的方程式
2. Fabrication of X-rays mask with carbon membrane for diffraction gratings [J] . Naoki Takahashi, Hiroshi Tujii, Megumi Katori, Microsystem Technologies . 2010,第s8a9期

机译：用碳膜制作用于衍射光栅的X射线掩模
3. Fabrication of X-rays mask with carbon membrane for diffraction gratings [J] . Naoki Takahashi, Hiroshi Tujii, Megumi Katori, Microsystem technologies . 2010,第8a9期

机译：用碳膜制作用于衍射光栅的X射线掩模
4. Advances in Fabrication of X-ray Masks based on Vitreous Carbon using a new UV sensitive positive Resist [C] . Anja Voigt, Josef Kouba, Marina Heinrich, European Mask and Lithography Conference . 2008

机译：使用新型紫外线敏感正性抗蚀剂制造基于玻璃碳的X射线掩模的进展
5. Substitution chemistry of the cobalt complexes R carbon cobalt(3) nonacarbonyl (R = hydrogen, formyl radical) with the diphosphine ligand 4,5-bis(diphenylphosphino)-4-cyclopenten-1,3-dione (bpcd): Syntheses, x-ray structures, and reactivity. [D] . Liu, Jie. 2001

机译：用二膦配体4,5-双（二苯基膦基）-4-环戊烯-1,3-二酮（bpcd）取代钴络合物R的碳（9）碳羰基钴（R =氢，甲酰基）：合成，x射线结构和反应性。
6. SPINE-compatible ‘carboloops’: a new microshaped vitreous carbon sample mount for X-ray and neutron crystallography [O] . Filippo Romoli, Estelle Mossou, Maxime Cuypers, 2014

机译：兼容SPINE的碳环：一种用于X射线和中子晶体学的新型微形玻璃碳样品支架
7. X-ray Mask with SiC Membrane for LIGA Process [O] . Hiroshi Ueno, Makoto Hosaka, Osamu Tabata, 1999

机译：X射线面罩用SiC膜进行LIGA工艺

VITREOUS CARBON MEMBRANE X-RAY MASKS FOR LIGA PROCESS

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