A Compacted In-line Wet Etch/Cleaning System With a Reverse Moving Control System

著录项

• 来源
  《IMID/IDMC/ASIA DISPLAY 2008;International display manufacturing conference 2008;International meeting on information display;Asia display 2008》|2008年|p.863-866|共4页
• 会议地点 Ilsan(KR);Ilsan(KR);Ilsan(KR);Ilsan(KR)
• 作者

  Seung Hyeok Im; Eou Sik Cho; Sang Jik Kwon;

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• 作者单位

  Display, Department of Electronics Engineering, Kyungwon University, San 65, Bokjung-dong, Soojung-gu, Seongnam, Kyunggi 461-701, Korea;

  rnDisplay, Department of Electronics Engineering, Kyungwon University, San 65, Bokjung-dong, Soojung-gu, Seongnam, Kyunggi 461-701, Korea;

  rnDisplay, Department of Electronics Engineering, Kyungwon University, San 65, Bokjung-dong, Soojung-gu, Seongnam, Kyunggi 461-701, Korea Tel: 82-31-750-5319, E-mail: sjkwon@kyungwon.ac.k;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 显示技术;显示设备、显示器;
• 关键词

  inline wet etching/cleaning system; reverse moving system; alternating motion; ITO pattern; CD skew;

  机译：在线湿法蚀刻/清洁系统；反向移动系统；交替运动ITO图案； CD倾斜;