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首页> 外文会议>Advanced materials for applications in extreme environments >Radiation Induced Cavity Formation and Gold Precipitation at the Interfaces of a ZrO_2/SiO_2/Si Heterostructure
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Radiation Induced Cavity Formation and Gold Precipitation at the Interfaces of a ZrO_2/SiO_2/Si Heterostructure

机译：ZrO_2 / SiO_2 / Si异质结构界面的辐射诱导空穴形成和金析出

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摘要

Thin films nano-crystalline zirconia of ～ 300 nm thick were deposited on Si substrate, and the samples were irradiated with 2 MeV Au~+ ions at temperatures of 160 and 400 K, up to fluences of 35 displacements per atom. The films were then studied using glancing incidence x-ray diffraction, Rutherford backscattering, secondary ion mass spectroscopy and transmission electron microscopy. During the irradiation, cavities were observed to form at the zirconia/silicon interface. The morphology of the cavities was found to be related to the damage state of the underlying Si substrate. Elongated cavities were observed when the substrate is heavily damaged but not amorphized; however, when the substrate is rendered amorphous, the cavities become spherical. As the ion dose increases, the cavities then act as efficient gettering sites for the Au. The concentration of oxygen within the cavities determines the order in which the cavities getter. Following complete filling of the cavities, the interface acts as the secondary gettering site for the Au. The Au precipitates are determined to be elemental in nature due to the high binding free energy for the formation of Au-silicides.
机译：将约300 nm厚的薄膜纳米晶氧化锆沉积在Si衬底上，并在160和400 K的温度下用2 MeV Au〜+离子辐照样品，每个原子的通量密度达到35。然后使用掠入射X射线衍射，卢瑟福背散射，二次离子质谱和透射电子显微镜对薄膜进行研究。在辐照期间，观察到在氧化锆/硅界面处形成空腔。发现腔的形态与下面的Si衬底的损坏状态有关。当基材严重受损但未非晶化时，观察到伸长的孔洞；然而，当衬底变成非晶态时，空腔变成球形。随着离子剂量的增加，腔体将成为Au的有效吸气部位。空腔内的氧气浓度决定了空腔吸气的顺序。在完全填充型腔之后，该界面将充当Au的次要吸气部位。由于形成Au-硅化物的高结合自由能，Au沉淀物被确定为自然元素。

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  • 来源
  • 会议地点 Boston MA(US);Boston MA(US);Boston MA(US);Boston MA(US)
  • 作者

    Philip D Edmondson; Chongmin Wang; Zihua Zhu; Fereydoon Namavar; William J.Weber; Yanwen Zhang;

  • 作者单位

    Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, U.S.A.;

    Pacific Northwest National Laboratory, Richland, WA 99352, U.S.A.;

    Pacific Northwest National Laboratory, Richland, WA 99352, U.S.A.;

    University of Nebraska Medical Center Omaha, NE 68198, U.S.A.;

    Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, U.S.A.,Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37831, U.S.A.;

    Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, U.S.A.,Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37831, U.S.A.;

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  • 正文语种 eng
  • 中图分类 工程材料一般性问题;
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