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首页> 外文会议>Advanced optics for defense applications: UV therough lwir II >Characterization of Reactive Plasma Ion Assisted HfO2 Films for Low Loss Optical Coatings in the DUV and MWIR
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Characterization of Reactive Plasma Ion Assisted HfO2 Films for Low Loss Optical Coatings in the DUV and MWIR

机译：DUV和MWIR中用于低损耗光学涂层的反应性离子辅助HfO2膜的表征

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摘要

Thick HfO_2 single layers derived from a reactive plasma ion assisted deposition were investigated with a designed film thickness of 800 nm. The film structure was modeled by fitting the corresponding variable angle spectroscopic ellipsometric data and correlated to the ratio of plasma ion momentum transfer during the film deposition. Scatter loss was calculated according to a multilayer model as well as a single surface model. Water absorption in the MWIR was used to confirm the revealed film structure. The results indicate that the scatter loss of the HfO_2 based high reflective optics can be estimated by using a single surface model in a first-order approximation from the DUV to the MWIR. A linear relationship between the refractive index inhomogeneity and the amount of plasma ion momentum transfer during the deposition was established. The total loss at 2.95 um is dominated by the absorptance loss, whereas both the absorptance and the scatter losses are reduced as the ratio of plasma ion momentum transfer increases. Appropriately optimizing and selecting deposition parameters enable low loss and environmentally stable HfO_2 coatings, leading to numerous defense applications from the DUV to the MWIR.
机译：研究了由反应性等离子体离子辅助沉积产生的厚HfO_2单层，其设计膜厚为800 nm。通过拟合相应的可变角度光谱椭圆偏振数据对膜结构进行建模，并将其与膜沉积过程中等离子体离子动量传递的比率相关。根据多层模型和单表面模型计算散射损耗。 MWIR中的吸水率用于确认所揭示的膜结构。结果表明，可以通过使用从DUV到MWIR的一阶近似的单表面模型来估计基于HfO_2的高反射光学器件的散射损耗。建立了折射率不均匀性与沉积过程中等离子体离子动量转移量之间的线性关系。在2.95 um处的总损耗由吸收率损耗决定，而随着等离子体离子动量传递比的增加，吸收率和散射损耗均减小。适当优化和选择沉积参数可实现低损耗和环境稳定的HfO_2涂层，从而导致了从DUV到MWIR的众多国防应用。

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