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首页> 外文会议>Advances in Abrasive Technology XI >Quartz Wafer Machining using MCF (Magnetic Compound Fluid)Polishing Liquid Frozen with Liquid Nitrogen
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Quartz Wafer Machining using MCF (Magnetic Compound Fluid)Polishing Liquid Frozen with Liquid Nitrogen

机译：使用MCF（磁性化合物液）进行石英晶片加工抛光液氮冷冻液

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摘要

This paper deals with the machining of quartz wafers using an MCF (Magnetic Compound Fluid) polishing liquid, frozen with liquid nitrogen. This type of polishing liquid is composed of water-based MF (Magnetic Fluid), iron powder, abrasive particle and α-cellulose, and consequently reacting to magnetic fields. Experiments of polishing quartz wafers using the MCF method were carried out on a previously developed apparatus. The results show that an MCF polishing liquid, frozen with liquid nitrogen, has greater material removal capability than one that has not been frozen. A frozen MCF polishing liquid containing larger abrasive particles yields a higher material removal rate, however the surface roughness deteriorates. The highest material removal rate and the best surface roughness were obtained when the percentage of water, in the frozen MCF polishing tool, was 34.7%.
机译：本文介绍了使用液氮冷冻的MCF（磁性化合物液）抛光液对石英晶片进行加工的方法。这种类型的抛光液由水基MF（磁性流体），铁粉，磨料颗粒和α-纤维素组成，因此会与磁场发生反应。使用MCF方法抛光石英晶片的实验是在先前开发的设备上进行的。结果表明，用液氮冷冻的MCF抛光液比未冷冻的MCF抛光液具有更高的材料去除能力。包含较大磨料颗粒的冷冻MCF抛光液可产生较高的材料去除率，但是表面粗糙度会降低。当冷冻的MCF抛光工具中水的百分比为34.7％时，可获得最高的材料去除率和最佳的表面粗糙度。

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