At-wavelength Optical Metrology Development at the ALS

机译：ALS的波长光学计量学发展

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Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and "performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

机译：为了获得更明亮的同步加速器辐射和自由电子激光束线，需要进行纳米聚焦和亮度保持，这要求X射线光学器件的表面倾斜度公差为100纳拉德。尽管X射线镜的制造精度和非原位计量精度随着时间的推移而有所提高，但光学器件的光束线原位性能通常受到特定应用因素的限制，例如X射线束的热负荷，温度漂移，对准，振动等。在当前的工作中，我们将讨论高级光源开发的高精度，原位，波长波前测量技术的最新结果，该技术将通过反射X射线光学器件超过100纳德精度的表面斜率测量。该技术最终将允许为X射线纳米聚焦实现闭环反馈系统。此外，我们还提供了专用的计量束线终端站，适用于各种现场计量和测试实验。还将介绍具有主动温度稳定功能的可弯曲Kirkpatrick-Baez（KB）反射镜的设计和性能。该反射镜目前用于研究，改进和优化原位反射镜的对准，弯曲和纳米聚焦必不可少的计量方法应用。

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来源
《Advances in metrology for x-ray and EUV optics III》|2010年|p.78010D.1-78010D.13|共13页
会议地点 San Diego CA(US)
作者
Sheng Yuan; Kenneth A. Goldberg; Valeriy V. Yashchuk; Richard Celestre; Iacopo Mochi; et al;
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作者单位

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

et al;

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会议组织
原文格式 PDF
正文语种 eng
中图分类光学计量仪器;
关键词
at-wavelength; optical metrology; nano-focusing; mirror alignment; slope measurement; interferometer; x-ray optics; synchrotron radiation;

机译：波长光学计量纳米聚焦；镜面对准；坡度测量干涉仪; X射线光学;同步辐射;

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专利

1. Development of in situ, at-wavelength metrology for soft X-ray nano-focusing [J] . Sheng Yuan, Valeriy V. Yashchuk, Kenneth A. Goldberg, Nuclear Instruments & Methods in Physics Research . 2011,第1期

机译：用于软X射线纳米聚焦的原位，波长计量技术的发展
2. At-wavelength metrology using the moire fringe analysis method based on a two dimensional grating interferometer [J] . Hongchang Wang, Sebastien Berujon, Ian Pape, Nuclear Instruments & Methods in Physics Research . 2013,第maya11期

机译：基于二维光栅干涉仪的莫尔条纹分析方法的波长计量
3. X-ray grating interferometer for in situ and at-wavelength wavefront metrology [J] . Kayser Yves, David Christian, Flechsig Uwe, Journal of synchrotron radiation . 2017,第1期

机译：X射线光栅干涉仪，原位和波长波前测量
4. At-wavelength Optical Metrology Development at the ALS [C] . Sheng Yuan, Kenneth A. Goldberg, Valeriy V. Yashchuk, SPIE on Advances in Metrology for X-ray and EUV Optics . 2010

机译：ALS的波长光学计量发育
5. Optical Coherence Tomography Metrology of Gradient Refractive Index Material and Freeform Optical Surfaces [D] . Yao, Jianing. 2016

机译：梯度折射率材料的光学相干断层扫描计量和自由形态光学表面
6. The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II [O] . F. Schäfers, P. Bischoff, F. Eggenstein, -1

机译：BESSY-II的用于紫外线和XUV反射和衍射光学的波长计量设施
7. Development of at-wavelength metrology using grating-based shearing interferometry at Diamond Light Source [O] . Hongchang Wang, Sebastien Berujon, Kawal Sawhney 2013

机译：在金刚石光源下使用基于光栅的剪切干涉测量的波长计量的研制

At-wavelength Optical Metrology Development at the ALS

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