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Density Related Properties of Metal Oxide Films

机译:金属氧化物膜的密度相关特性

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摘要

The density of the material in a deposited film determines many important film properties, for example hardness and abrasions resistance, adherence to the substrate, refractive index, film stress, flatness and film permeation. Chemical compound films like metal oxides, some nitrides and oxynitrides are mainly produced by reactive PVD processes. The energy input into the growing film strongly influence the density of the resulting film. High energetic coating conditions result e.g. in a high refractive index, but often also in relatively high residual optical absorption and high compressive film stress. In order to obtain films with improved properties immediately after deposition without time consuming post-deposition heat treatments, depositions of RLVIP-Ta_2O_5 films were carried out under relatively high oxygen pressures and under special rate conditions. The achieved reproducible film properties can practically be accepted for many low loss optical film applications.
机译:沉积膜中材料的密度决定了许多重要的膜性能,例如硬度和耐磨性,对基材的粘附性,折射率,膜应力,平坦度和膜渗透性。金属氧化物,某些氮化物和氮氧化物等化合物膜主要通过反应性PVD工艺生产。输入到生长膜中的能量强烈影响所得膜的密度。高能涂层条件导致例如在高折射率下,通常还具有相对较高的残留光吸收和高压缩膜应力。为了在沉积后立即获得具有改善的性能的膜而不进行费时的沉积后热处理,在相对较高的氧气压力和特殊速率条件下进行RLVIP-Ta_2O_5膜的沉积。对于许多低损耗光学膜应用而言,所获得的可再现膜性能实际上可以接受。

著录项

  • 来源
    《Advances in Optical Thin Films》|2003年|p.1-11|共11页
  • 会议地点 St. Etienne(FR)
  • 作者

    H.K Pulker; S. Schlichtherle;

  • 作者单位

    Thin Film Technology Group, Institute of Ion Physics, University of Innsbruck, A-6020 Innsbruck, Technikerstrasse 25, Austria;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理学;
  • 关键词

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