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Photothermal analysis of sub-micrometric scale defects in laser damage studies

机译：激光损伤研究中亚微米级缺陷的光热分析

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摘要

Laser-induced damage has long been widely acknowledged as a localized phenomenon associated with the presence of defects such as nodules, scratches, fractures, polishing or cleaning residues, impurities, contaminants, metal or dielectric inclusions, etc. Destructive investigations in ultra pure fused silica have led to the conclusion that defects, typically a few nanometers in size, were responsible for laser damage initiation. The understanding of damage phenomena requires the development of more sophisticated, non destructive tools with both high spatial resolution and high sensitivity, to detect defects as small as possible. Photothermal microscopy has been widely employed to characterize optical absorption, thermal properties of optical materials and for mapping defects. This technique has been coupled and compared with scattering mapping for studying laser damage processes before and after irradiation. Furthermore the capability of collinear photothermal deflection to reach sub-micrometric resolution by reduction of the pump beam diameter has been theoretically explored and experimentally demonstrated on specially prepared absorbing targets. A photothermal microscope based on photothermal deflection of the transmitted beam and well-suited for multi-scale studies of absorbing defects in thin films has been coupled with an experimental set-up allowing damage threshold measurement at the same wavelength. We present an overview of these developments in the field of photothermal microscopy and scattering mapping in connection with laser damage.
机译：长期以来，激光引起的损坏已被广泛认为是与缺陷，结节，划痕，破裂，抛光或清洁残留物，杂质，污染物，金属或电介质夹杂物等缺陷有关的局部现象。超纯熔融石英的破坏性研究得出的结论是，通常为几纳米大小的缺陷是造成激光损伤的原因。对损坏现象的理解要求开发具有更高空间分辨率和高灵敏度的更复杂，无损的工具，以检测尽可能小的缺陷。光热显微镜已被广泛用于表征光学材料的光学吸收，热性能以及绘制缺陷图。该技术已被耦合并与散射图进行比较，以研究照射前后的激光损伤过程。此外，理论上已经探讨了共线光热偏转通过减小泵浦光束直径达到亚微米分辨率的能力，并在专门准备的吸收目标上进行了实验证明。基于透射光束的光热偏转并且非常适合用于薄膜吸收缺陷的多尺度研究的光热显微镜已经与实验装置相结合，可以在相同波长下测量损伤阈值。我们概述了与激光损伤有关的光热显微镜和散射测绘领域的这些发展。

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