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Ion beam deposited Mo/Si multilayers for EUV Imaging applications in Astrophysics

机译：离子束沉积的Mo / Si多层膜，用于天体物理学中的EUV成像应用

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Imaging of the solar corona by selecting Fe Ⅸ (λ=17.1nm,), Fe Ⅻ (λ=19.5nm), Fe XV (λ=28.4nm) and He Ⅱ (λ=30.4nm) emission lines with a Ritchey-Chretien telescope requires to coat the optics with multilayers having a high accuracy in their layer thicknesses, a high reflectivity and an optimal bandpass. Multilayers were simulated in order to determine the most adequate formula for each wavelength channel. Mo/Si coatings were deposited by using the ion beam sputtering technique in a high vacuum chamber equipped with a micro balance and an in-situ reflectometer. The multilayers were studied by grazing angle reflectometry at 0.1541nm, and their reflectances around the operating wavelengths were measured on the SA62 IAS/LURE beam line of the SuperACO synchrotron facility located at Orsay. In addition, aging versus time and behavior of the multilayers under a rapid thermal annealing were investigated. Performances of the ion-beam deposited multilayers have been improved compared to the Mo/Si coatings obtained in the past by the e-beam evaporation technique for the SOHO mission Extreme UV Imaging Telescope (BIT). The EUVI telescopes for the STEREO mission are being proceduced by depositing these new generation of multilayers onto primary and secondary mirrors. The reflectivity measurements on a telescope are presented.
机译：通过使用Ritchey-Chretien选择FeⅨ（λ= 17.1nm，），FeⅫ（λ= 19.5nm），Fe XV（λ= 28.4nm）和HeⅡ（λ= 30.4nm）发射线来成像太阳日冕望远镜需要在光学器件上涂覆多层，这些多层的层厚应具有高精度，高反射率和最佳带通。为了确定每个波长通道的最适当公式，对多层进行了模拟。通过使用离子束溅射技术在配备有微量天平和原位反射计的高真空室中沉积Mo / Si涂层。通过在0.1541nm处的掠角反射法研究了多层，并且在位于Orsay的SuperACO同步加速器设施的SA62 IAS / LURE光束线上测量了它们在工作波长附近的反射率。另外，研究了在快速热退火下老化随时间的变化以及多层的行为。与过去通过用于SOHO任务极紫外成像望远镜（BIT）的电子束蒸发技术获得的Mo / Si涂层相比，离子束沉积多层膜的性能得到了改善。通过将这些新一代的多层沉积到主镜和副镜上，可以生产用于STEREO任务的EUVI望远镜。介绍了望远镜的反射率测量。

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