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首页> 外文会议>Advances in Thin-Film Coatings for Optical Applications III >Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition
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Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition

机译：通过等离子体离子辅助沉积制备的紫外线窄带通滤光片的波前控制

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摘要

Metal oxide layers produced by plasma ion-assisted deposition are extensively used for complex optical coatings due to the availability of materials, the high packing density of films, and the smooth surfaces. Stringent optical surface figure specifications necessary for both laser optics and precision optics require film stress to be well controlled and surface deformation to be corrected or compensated. In this paper, SiO_2 based single cavity UV narrow bandpass filters were prepared by plasma ion-assisted deposition. The correlation between film stress, refractive index, deposition parameters, and post deposition annealing was established. The film stress was calculated based on interferometric surface deformation. The refractive index and film thickness were determined by means of variable angle spectroscopic ellipsometry. The center wavelength of the filters was obtained through spectral transmission measurement. The results suggest that the wavefront distortion of the multilayer coatings is dominated by the compressive stress of the SiO_2 layers, and can be controlled and corrected by the amount of plasma ion momentum transfer, substrate temperature, post deposition annealing, and stress compensation via backside SiO_2 coating. Based on the understanding of the mechanical and optical properties, the wavefront correction technique enables us to satisfy stringent surface figure specifications.
机译：由于材料的可获得性，薄膜的高堆积密度和光滑的表面，通过等离子体离子辅助沉积产生的金属氧化物层被广泛用于复杂的光学涂层。激光光学和精密光学所必需的严格的光学表面图形规范要求对薄膜应力进行良好控制，并纠正或补偿表面变形。本文通过等离子体离子辅助沉积制备了SiO_2基单腔紫外窄带通滤光片。建立了薄膜应力，折射率，沉积参数和沉积后退火之间的相关性。基于干涉表面变形来计算膜应力。折射率和膜厚通过可变角度光谱椭圆仪测定。滤光片的中心波长是通过光谱透射测量获得的。结果表明，多层涂层的波前畸变主要由SiO_2层的压应力控制，并且可以通过等离子体离子动量转移量，基板温度，沉积后退火和通过背面SiO_2进行应力补偿来控制和校正。涂层。基于对机械和光学特性的理解，波前校正技术使我们能够满足严格的表面图形规范。

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