【24h】

HARDNESS AND FRICTIONAL PROPERTIES OF ALUMINA COATINGS BY AC INVERTED MAGNETRON SPUTTERING TECHNIQUE

机译:交流磁控溅射技术对氧化铝涂层的硬度和摩擦性能

获取原文
获取原文并翻译 | 示例

摘要

Alumina thin film coatings of 500 nm thickness were deposited on silicon substrates by AC inverted magnetron sputtering technique at 350℃. The effect of deposition power and oxygen partial pressure on the hardness and frictional performances of the alumina coatings were investigated using a nanoindenter. The film hardness varied with both the power and the oxygen partial pressure with the power had more pronounced effect. The maximum hardness of 22 GPa was obtained at an optimum power of 5 kW and oxygen partial pressure of 40%. The coefficient of friction decreased with the increase in hardness.
机译:在350℃下通过交流磁控溅射技术将500nm厚的氧化铝薄膜涂层沉积在硅基板上。使用纳米压头研究了沉积功率和氧分压对氧化铝涂层硬度和摩擦性能的影响。膜硬度随功率的变化而变化,氧分压随功率的变化而变化更为显着。在5 kW的最佳功率和40%的氧气分压下获得22 GPa的最大硬度。摩擦系数随着硬度的增加而降低。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号