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COMPENSATING FILM STRESS IN THIN MIRRORS USING ION IMPLANTATION

机译：通过离子注入补偿薄膜镜中的膜应力

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Ion implantation is a useful method of compensating for compressive film stress in silicon mirrors. The process is simple, since only three process steps beyond the normal mirror production process are required. We demonstrated reduction of coating stress deformation using ion implantation by a factor of over 20, nearly as effective as patterning stressed films [10], but requiring far fewer process steps. We demonstrated that the film stress to be compensated can be variable from run-to-run with no significant effect on our ability to compensate. In addition, we have demonstrated stability of implanted wafers with the chosen annealing process, to within our metrology repeatability.

机译：离子注入是补偿硅镜中压缩膜应力的有用方法。该过程很简单，因为仅需要常规镜面生产过程之外的三个过程步骤。我们证明了使用离子注入可将涂层应力变形降低20倍以上，几乎与图案化应力膜[10]一样有效，但所需的工艺步骤却少得多。我们证明了要补偿的薄膜应力可以随运行而变化，而对我们的补偿能力没有重大影响。另外，我们已经证明了在选择的退火工艺下所植入晶片的稳定性，这在我们的计量重复性范围内。

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《33rd ASPE annual meeting 2018》|2018年|253-258|共6页
会议地点 Las Vegas(US)
作者
Brandon D. Chalifoux; Youwei Yao; Kevin B. Woller; Ralf K. Heilmann; Mark L. Schattenburg;
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作者单位

Department of Mechanical Engineering;

Kavli Institute for Astrophysics and Space Science;

Plasma Science and Fusion Center, Massachusetts Institute of Technology, Cambridge, MA USA;

Kavli Institute for Astrophysics and Space Science;

Kavli Institute for Astrophysics and Space Science;

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1. Synthesis of a-C thin films by plasma-based ion implantation using an electron cyclotron resonance plasma source with a mirror field [J] . Watanabe T., Yamamoto K., Tsuda O., Surface & Coatings Technology . 2003,第0期

机译：使用具有镜场的电子回旋共振等离子体源通过基于等离子体的离子注入合成a-C薄膜
2. Stress compensated MEMS magnetic actuator based on magnetostrictive Fe65Co35 thin films [J] . Singh Jitendra, Kumar Ajay, Chelvane J. Arout Sensors and Actuators, A. Physical . 2019,第期

机译：基于磁致伸缩Fe65Co35薄膜的应力补偿MEMS磁性致动器
3. Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation [J] . W.L. Li, W.D. Fei, T. Hanabusa Applied Surface Science . 2006,第8期

机译：沉积条件对磁控溅射离子注入氮化铁薄膜残余应力的影响
4. COMPENSATING FILM STRESS IN THIN MIRRORS USING ION IMPLANTATION [C] . Brandon D. Chalifoux, Youwei Yao, Kevin B. Woller, Annual Meeting of the American Society for Precision Engineering . 2018

机译：使用离子植入补偿薄镜中的膜应力
5. Novel Low Temperature Processing for Enhanced Properties of Ion Implanted Thin Films and Amorphous Mixed Oxide Thin Film Transistors. [D] . Vemuri, Rajitha. 2013

机译：用于增强离子注入薄膜和非晶混合氧化物薄膜晶体管性能的新型低温工艺。
6. Designing functionality in perovskite thin films using ion implantation techniques: Assessment and insights from first-principles calculations [O] . Vinit Sharma, Andreas Herklotz, Thomas Zac Ward, -1

机译：使用离子注入技术设计钙钛矿薄膜的功能：第一性原理计算的评估和见解
7. Thin films-preparation, structure and properties. Formation of Fe16N2 by nitrogen ion implantation into iron thin films. [O] . Kensuke NAKAJIMA, Shoichi OKAMOTO, Kenkichiro KOBAYASHI, 1987

机译：薄膜制备，结构和性质。通过氮离子注入到铁薄膜中形成Fe16N2。

COMPENSATING FILM STRESS IN THIN MIRRORS USING ION IMPLANTATION

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