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Molecular Layer Deposition of Nanoscale Organic Films for Nanoelectronics Applications

机译：用于纳米电子应用的纳米级有机薄膜的分子层沉积

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摘要

The development of new processes for depositing thin organic films has seen a renewed interest due to an increased demand for nanoelectronic devices. Tools for producing these devices, such as advanced lithographic patterning, often require ultrathin films with a high degree of compositional homogeneity. Molecular layer deposition (MLD) is a promising method for creating films with these qualities. By using an alternating sequence of self-saturating reactions, MLD can produce conformal films with a high degree of control over the composition and thickness. In a series of studies by our group, photoresist films were grown using MLD by incorporating acid-labile groups into an MLD-grown polyurea chain. The inclusion of photoacid generators was demonstrated both as a soaked-in additive as well as a polymer-bound reactive group. These films show potential as good photoresist materials, with some designs exhibiting sensitivities of 30 μC/cm~2 with 100 kV electron beam exposure, and a line resolution of sub-100 nm.
机译：由于对纳米电子器件的需求增加，用于沉积有机薄膜的新工艺的开发引起了新的兴趣。用于生产这些装置的工具，例如高级光刻图案，通常需要具有高度组成均匀性的超薄膜。分子层沉积（MLD）是一种产生具有这些品质的薄膜的有前途的方法。通过使用交替的自饱和反应序列，MLD可以生产高度控制成分和厚度的保形膜。在我们小组的一系列研究中，使用MLD通过将酸不稳定基团掺入MLD生长的聚脲链中来生长光刻胶膜。已证明包含光酸产生剂既可以作为浸入的添加剂，也可以作为与聚合物结合的反应性基团。这些膜显示出作为良好的光致抗蚀剂材料的潜力，其中一些设计在100 kV电子束曝光下表现出30μC/ cm〜2的灵敏度，线分辨率小于100 nm。

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  • 会议地点 Cancun(MX)
  • 作者

    David S. Bergsman; Han Zhou; Stacey F. Bent;

  • 作者单位

    Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA;

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