首页> 外文会议>Nanophotonics Australasia 2017 >Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography

【24h】

Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography

机译：用2光子光刻技术制作的微透镜固有粗糙度的表面平滑

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

Two-photon polymerization by direct laser writing enables to write refractive micro-optical elements with sub-urn precision. The trajectories and layering during the direct writing process often result in roughness in the range of the writing increment, which has adverse effects for optical applications. Instead of increasing overlap between adjacent voxels, roughness in the range of 100 nm can be smoothed out by post-processing. For this a method known as TASTE was developed, which allows polishing of surfaces without changing the structural details or the overall shape. It works particularly well with thermoplastic polymers and enables sub-10 nm roughness. The optical quality was confirmed for an array with several 100 microlenses.

机译：通过直接激光写入的双光子聚合使得能够以亚precision精度写入折射微光学元件。直接写入过程中的轨迹和分层通常会导致写入增量范围内的粗糙度，这对光学应用会产生不利影响。代替增加相邻体素之间的重叠，可以通过后处理来平滑100 nm范围内的粗糙度。为此，开发了一种称为TASTE的方法，该方法可以在不改变结构细节或整体形状的情况下对表面进行抛光。它与热塑性聚合物的配合效果特别好，并且粗糙度低于10 nm。确认具有几百个微透镜的阵列的光学质量。

著录项

来源
《Nanophotonics Australasia 2017》|2017年|104561Z.1-104561Z.9|共9页
会议地点 Melbourne(AU)
作者
Helmut Schift; Robert Kirchner; Nachiappan Chidambaram; Mirco Altana;
展开▼
作者单位

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, 5232 Villigen PSI, Switzerland;

Technische Universitat Dresden, IHM, 01062 Dresden, Germany;

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, 5232 Villigen PSI, Switzerland;

Heptagon Oy, Moosstrasse 2, 8803 Rueschlikon, Switzerland;

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类
关键词
Micro-lens array; glass transition temperature; surface roughness; polymer; 2-photon polymerization;

机译：微透镜阵列；玻璃化转变温度；表面粗糙度;聚合物; 2-光子聚合;

相似文献

外文文献
中文文献
专利

1. From superamphiphobic to amphiphilic polymeric surfaces with ordered hierarchical roughness fabricated with colloidal lithography and plasma nanotexturing [J] . Ellinas K., Tserepi A., Gogolides E. Langmuir: The ACS Journal of Surfaces and Colloids . 2011,第7期

机译：从超疏水性到两亲性聚合物表面，通过胶体光刻和等离子体纳米织构制造，具有有序的层次粗糙度
2. Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography [J] . Jeong H.E., Kwak M.K., Park C.I., Journal of Colloid and Interface Science . 2009,第1期

机译：紫外辅助毛细管力光刻技术制备的纳米工程双粗糙度表面的润湿性
3. Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography [J] . Khatijah Aisha Yaacob, Siti Noorhaniah Yusoh Beilstein Journal of Nanotechnology . 2016,第1期

机译：氢氧化四甲铵/异丙醇湿法刻蚀对AFM光刻制备的硅纳米线的几何形状和表面粗糙度的影响
4. Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography [C] . Helmut Schift, Robert Kirchner, Nachiappan Chidambaram, SPIE Conference on Nanophotonics Australasia . 2017

机译：用2-光子光刻制造的微透镜固有粗糙度的表面平滑
5. Fabricating Superhydrophobic and Superoleophobic Surfaces with Multiscale Roughness Using Airbrush and Electrospray [D] . AL-Milaji, Karam N. 2016

机译：使用喷枪和电喷雾制造具有多尺度粗糙度的超疏水和超疏油表面
6. Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography [O] . Siti Noorhaniah Yusoh, Khatijah Aisha Yaacob 2016

机译：氢氧化四甲铵/异丙醇湿法刻蚀对AFM光刻制备的硅纳米线的几何形状和表面粗糙度的影响
7. Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography [O] . Siti Noorhaniah Yusoh, Khatijah Aisha Yaacob 2016

机译：四甲基氢氧化铵/异丙醇湿蚀刻对aFm光刻制备的硅纳米线几何形状和表面粗糙度的影响
8. Infrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks [R] . Spector, S. J., Astolfi, D. K., Doran, S. P., 2001

机译：使用光学光刻和相移掩模制造的红外频率选择表面

Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography

摘要

著录项

相似文献

相关主题

期刊订阅