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首页> 外文会议>Charged Particle Optics IV >Global space charge effects in high-throughput electron-beam lithography
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Global space charge effects in high-throughput electron-beam lithography

机译：高通量电子束光刻中的全局空间电荷效应

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Abstract: Recently global space charge effects were found to seriously limit the performance of high throughput projection electron beam lithography systems. A fundamental analytical theory describing the global space charge lens has been developed using the variational principle. A modified paraxial ray equation and a set of aberration integrals is derived. All the space charge effects, including the defocus, the magnification variation, and the third order aberrations, are found to be proportional to the perveance, the weighted integrals of the normalized current density distribution, and a combination of the system parameters, such as: the field size and the convergence angle. A simple scaling law for the space charge aberrations, where the aberrations at the image edge scale linearly with the radial dimension, has been found for the telecentric projection configuration. Both the theoretical calculations and the Monte Carlo simulations have been done for a SCALPEL configuration with 25 $mu@A beam current and two scaled systems, whose radial dimensions are scaled from SCALPEL by twice and 3 times, and current by 4 times and 9 times respectively at 10 kV. From both theoretical and simulation results, the space charge aberrations at the edge show approximately a 63 times increase in the twice-scaled system, and about 95 times increase in the three-time-scaled system. All these aberration scaling factors are very close to those predicted from the simple scaling law. An experiment based on the simple scaling law was designed to verify the theory and evaluate the performance of the high throughput projection system. In the scaled testing column which has a 1.6 mA beam current, 5 kV beam voltage, 40 cm column length, 8 mm field diameter, and 4 mrad convergence angle at the mask, the space-charge-aberration blur to be measured will be as large as 200 micrometer. Then the final image blur of the real high throughput system can be derived by using the scaling law. !15
机译：摘要：最近发现，全球空间电荷效应严重限制了高通量投影电子束光刻系统的性能。使用变分原理已经开发了描述全局空间电荷透镜的基本分析理论。推导了改进的近轴射线方程和一组像差积分。发现所有空间电荷效应，包括散焦，放大倍率变化和三阶像差，都与反射率，归一化电流密度分布的加权积分以及系统参数的组合成正比，例如：场大小和会聚角。对于远心投影配置，已经找到了空间电荷像差的简单缩放定律，其中图像边缘的像差与径向尺寸成线性比例。对于具有25 $ mu @ A束电流和两个缩放系统的SCALPEL配置，已经完成了理论计算和蒙特卡罗模拟，径向尺寸是SCALPEL的两倍和3倍，电流是4倍和9倍。分别在10 kV下。从理论和仿真结果来看，边缘的空间电荷像差在两倍缩放的系统中大约增加了63倍，在三次缩放的系统中大约增加了95倍。所有这些像差缩放因子都非常接近根据简单缩放定律预测的因子。设计了基于简单比例定律的实验，以验证理论并评估高通量投影系统的性能。在具有1.6 mA束电流，5 kV束电压，40 cm柱长，8 mm场直径和4 mrad会聚角的定标测试柱中，要测量的空间电荷像差模糊为高达200微米。然后，可以通过使用缩放定律来得出实际高吞吐量系统的最终图像模糊。 ！15

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