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首页> 外文会议>Conference on Design for Manufacturability through Design-Process Integration; 20080128-29; San Jose,CA(US) >Accurate model base verification scheme to eliminate hotspots and manage warmspots
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Accurate model base verification scheme to eliminate hotspots and manage warmspots

机译：准确的模型库验证方案，可消除热点并管理热点

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摘要

Lithography compliance check (LCC), which is verification of layouts using lithography simulation, is an essential step under the current low kl lithography condition. However a conventional LCC scheme does not consider process proximity effect (PPE) differences among several manufacturing tools, especially for exposure tools. In this paper two concepts are proposed. One is PPE monitoring and matching using warmspots. The warmspots are patterns that have small process window. They are sensitive to difference of illumination conditions and are basically 2-dimensional patterns. The other is LCC using multiple simulation models that represent each PPE on exposure tools. All layouts are verified by these models and the layouts are fixed if hotspots (catastrophic failure on wafer) are found. This verification step is repeated until all hotspots are eliminated from the layouts. Based on these concepts, robust cell layouts that have no hotspot under the several PPE conditions are created.
机译：在当前的低kl光刻条件下，光刻一致性检查（LCC）是使用光刻仿真验证布局的必不可少的步骤。但是，传统的LCC方案没有考虑几种制造工具（尤其是曝光工具）之间的工艺邻近效应（PPE）差异。本文提出了两个概念。一种是使用热点进行PPE监视和匹配。热点是具有较小处理窗口的模式。它们对照明条件的不同敏感，并且基本上是二维图案。另一个是使用多个模拟模型的LCC，这些模型代表曝光工具上的每个PPE。所有布局均由这些模型验证，并且如果发现热点（晶圆上的灾难性故障），则布局是固定的。重复此验证步骤，直到从布局中消除所有热点为止。基于这些概念，创建了在几种PPE条件下都没有热点的可靠的单元布局。

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