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首页> 外文会议>Conference on Diffractive and Holographic Technologies for Integrated Photonic Systems Jan 22-23, 2001, San, Jose, USA >Development of a high-speed, high fill-factor phase-only spatial light modulator
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Development of a high-speed, high fill-factor phase-only spatial light modulator

机译：高速，高填充因子的仅相位空间光调制器的开发

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摘要

This paper demonstrates a MEMS (microelectromechanical systems) technology for the fabrication of a high-speed, phase-only spatial light modulator (SLM). An independently developed low temperature MEMS process for the vertical integration of MEMS directly onto VLSI substrates is presented. The low temperature process enables the use of standard VLSI wafers integrated with MEMS at the post-process level.A MEMS stracture has been demonstrated that produces polarization-independent pixel-wise pure-piston phase delay with optically flat micromirrors fabricated on a mock VLSI substrate as a proof-of-concept device. The gray-scale phase modulation offers -pi to +pi dynamic range in the ultraviolet to near infrared spectrum without mechanical contact. Pixel sizes as small as 40 microns with 86 percent fill-factor have been demonstrated. In addition to high fill-factor, micromirror reflectivity exceeding 95 percent that significantly minimizes optical insertion loss and enables high power operation has also been confirmed with this novel process. Furthermore, single-pixel operating speeds in excess of 100 kHz have been verified. The high operating speeds enable electrically addressed framing rates that are limited by the electronic interface bandwidth as opposed to the optical modulating element. We are presently fabricating a monolithically integrated phase-only modulator on CMOS VLSI creating a compact, lightweight, low-cost SLM. The resulting 256x256, 4 kHz framing rate, gray-scale phase-only SLM has applications including adaptive optics, high-speed optical correlators, phased array beam steering and diffractive beam forming.
机译：本文演示了一种用于制造高速，仅相位空间光调制器（SLM）的MEMS（微机电系统）技术。提出了一种独立开发的低温MEMS工艺，用于将MEMS直接垂直集成到VLSI基板上。低温工艺可以在后处理级别使用与MEMS集成的标准VLSI晶片。已经证明了MEMS结构可以通过在模拟VLSI基板上制造的光学平面微镜产生与偏振无关的像素方式纯活塞相位延迟。作为概念验证设备。灰度相位调制在没有机械接触的情况下在紫外到近红外光谱范围内提供-pi到+ pi的动态范围。像素尺寸小至40微米，填充系数达86％，已得到证明。除了高填充率外，这种新颖的工艺还证实了超过95％的微镜反射率可显着降低光学插入损耗并使高功率工作。此外，已经验证了超过100 kHz的单像素工作速度。高的工作速度使得电寻址的成帧速率受到与光学调制元件相反的电子接口带宽的限制。我们目前正在CMOS VLSI上制造单片集成的仅相位调制器，以创建紧凑，轻便，低成本的SLM。最终的256x256、4 kHz帧频，纯灰度SLM具有以下应用：自适应光学，高速光学相关器，相控阵光束控制和衍射光束形成。

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