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首页> 外文会议>Conference on Emerging Lithographic Technologies Ⅴ Feb 27-Mar 1, 2001, Santa Clara, USA >High-Resolution Proximity Printing by Wave-Optically Designed Masks
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High-Resolution Proximity Printing by Wave-Optically Designed Masks

机译：通过波光学设计的掩模进行高分辨率接近印刷

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摘要

Proximity printing is a high throughput and cost effective lithographic technique for production of e.g. large area flat panel displays. The resolution of this technique, however, is limited due to diffraction effects that occur at mask pattern edges. We can improve the resolution drastically by replacing the conventional photomask with a mask which compensates these diffraction effects. The resulting mask modulates phase and amplitude of the exposure beam in such a way that the required image is formed at a predetermined distance behind the mask. In this work we describe the basic principles behind the resolution enhancement technique and explain the mathematical model to design this new type of proximity mask. The feasibility of the method is demonstrated by theoretical calculations as well as by practical experiments. The diffractive structures that have been examined are designed to form an image at a distance of 50 micron behind the mask. The mask contains 2 amplitude and 4 phase levels and the pixel size is 1 micron. Under these conditions a 3-micron line/space pattern is clearly resolved, whereas under conventional conditions the image is completely distorted.
机译：邻近印刷是一种用于生产例如单面印刷的高产量和低成本的平版印刷技术。大面积平板显示器。然而，由于在掩模图案边缘处发生的衍射效应，该技术的分辨率受到限制。通过用补偿这些衍射效应的光罩代替传统的光罩，我们可以大大提高分辨率。所得的掩模以这样的方式调制曝光光束的相位和幅度，使得所需的图像形成在掩模后面的预定距离处。在这项工作中，我们描述了分辨率增强技术背后的基本原理，并解释了设计这种新型接近掩模的数学模型。通过理论计算和实际实验证明了该方法的可行性。设计了已经检查过的衍射结构，以在掩模后面50微米的距离处形成图像。掩模包含2个幅度和4个相位级别，像素大小为1微米。在这些条件下，可以清晰地分辨出3微米的线/空间图案，而在常规条件下，图像会完全失真。

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