Projection Mask-Less Lithography

机译：投影式无掩模光刻

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Recent studies have shown the feasibility of Projection Mask-Less Lithography (PML2) for small and medium volume device production (2-5 WPH) for the 45nm technology node. This PML2 tool concept comprises a combined electrostatic-magnetic electron optical column with 200 x de-magnification factor. Instead of a mask there is a programmable aperture plate enabling dynamic beam structuring. Wafer exposure is done stripe-by-stripe with a scanning 300mm wafer stage. Detailed calculations of the PML2 optical column (2-step demagnification) including Monte-Carlo simulations of Coulomb interactions are presented. The extendibility of PML2 technology for the 32nm node will be discussed.

机译：最近的研究表明，无投影掩膜光刻技术（PML2）可用于45nm技术节点的中小批量器件生产（2-5 WPH）。这个PML2工具概念包括一个具有200 x缩小倍数的组合式电磁电磁光柱。代替掩模的是可编程的孔板，可实现动态光束结构化。晶圆曝光是通过扫描300mm晶圆平台逐条进行的。提出了PML2光学柱的详细计算（两步缩小），包括库仑相互作用的蒙特卡罗模拟。将讨论PML2技术在32nm节点上的可扩展性。

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来源
《Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US》|2004年|P.601-609|共9页
会议地点 Santa Clara CA(US)
作者
Christoph Brandstaetter; Hans Loeschner; Gerhard Stengl; Gertraud Lammer; Herbert Buschbeck; Elmar Platzgummer; Hans-Joachim Doering; Thomas Elster; Olaf Fortagne;
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作者单位

IMS Nanofabrication GmbH, A-1020 Vienna, Austria;

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原文格式 PDF
正文语种 eng
中图分类半导体技术;
关键词
mask-less lithography; electron beam optics; programmable aperture plate; blanking aperture array; ML2;

机译：无掩模光刻；电子束光学；可编程孔板；空白孔阵列； ML2;

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1. Projection Mask-Less Lithography (PML2) [J] . Christof Klein, Jan Klikovits, Laszlo Szikszai, Microelectronic Engineering . 2010,第5a8期

机译：投影式无掩模光刻（PML2）
2. Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator [J] . Stefan Eder-Kapl, Ernst Haugeneder, Helmut Langfischer, Microelectronic Engineering . 2006,第4a9期

机译：无投影无掩模光刻（PML2）：多光束消隐演示器的第一个结果
3. Assembly of an aperture plate system for projection mask-less lithography [J] . M. Mohaupt, R. Eberhardt, C. Damm, Microelectronic Engineering . 2006,第4a9期

机译：用于无投影光刻的光圈板系统的组装
4. Projection mask-less lithography and nanopatterning with electron and ion multi-beams [C] . Christof Klein, Elmar Platzgummer, Hans Loeschner European mask and lithography conference . 2010

机译：电子和离子多束无投影掩模光刻和纳米图案
5. A Thermally-actuated Micro-shutter Array Device for Optical Mask-less Lithography [D] . He, Zitao. 2018

机译：无光掩模光刻的热驱动微快门阵列器件
6. Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography [O] . Yingzhi Wang, Tailin Han, Xu Jiang, 2020

机译：基于双算子的模式转移路径规划和数字掩模投影光刻的双群蚁群算法
7. Mask-less lithography for fabrication of optical waveguides [O] . Dubov, Mykhaylo, Natarajan, S.R., Williams, John A.R., 2008

机译：用于制造光波导的无掩模光刻

Projection Mask-Less Lithography

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