Phase grating fabrication in glass via ion implantation

机译：通过离子注入在玻璃中制造相位光栅

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Transmission phase gratings have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV -1.6 MeV range, through photoresist masks. Both mono- and multienergy implantations have been applied. Diffraction efficiencies of the gratings as function of the energy and dose of the ion implantation were measured.The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast-microscopy and scanning electron microscopy. Diffraction efficiencies up to 20% have been obtained.

机译：已经通过光刻胶掩模通过注入500 keV -1.6 MeV范围内的能量的氦和氮离子，在玻璃样品中设计和制造了透射相位光栅。单能量和多能量植入均已应用。测量了光栅的衍射效率随离子注入能量和剂量的变化。还通过干涉，相差显微镜和扫描电子显微镜直接测量了光栅线的相位分布。已获得高达20％的衍射效率。

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来源
《Conference on Integrated Optical Devices: Fabrication and Testing, Oct 30-Nov 1, 2002, Brugge, Belgium》|2002年|p.171-182|共12页
会议地点 Brugge(BE)
作者
Istvan Banyasz; Miklos Fried; Csaba Duecsoe; Zofia Vertesy;
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作者单位

Research Institute of Solid State Physics and Optics of the Hungarian Academy of Sciences, P.O.B. 49, H-1525, Budapest, Hungary;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
diffraction grating; ion implantation; interference microscopy; phase-contrast microscopy;

机译：衍射光栅;离子注入;干涉显微镜;相差显微镜;

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Phase grating fabrication in glass via ion implantation

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