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首页> 外文会议>Conference on Integrated Optics: Devices, Materials, and Technologies Ⅵ Jan 21-23, 2002 San Jose, USA >Waveguide fabrication in fused silica using tightly focused femtosecond laser pulses
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Waveguide fabrication in fused silica using tightly focused femtosecond laser pulses

机译：使用紧密聚焦的飞秒激光脉冲在熔融石英中制造波导

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摘要

Refractive index changes have been induced inside bulk fused silica by using femtosecond (fs) laser pulses tightly focused inside the material. Waveguides have been fabricated inside the glass by scanning the glass with respect to the focal point of the laser beam. The refractive index change is estimated to be ～ 10~(-4). Other more complex three-dimensional structures have also been fabricated (curved waveguides, splitters, and interferometers). We also report on fluorescence spectroscopy of the fs-modified fused silica using a confocal microscopy setup. Using a 488 nm excitation source, a fluorescence at 630 nm is observed from the modified glass, which is attributed to the presence of non-bridging oxygen hole center (NBOHC) defects created by the fs pulses. The fluorescence decays with prolonged exposure to the 488 nm light, indicating that the defects are being photobleached by the excitation light.
机译：通过使用紧密聚焦在材料内部的飞秒（fs）激光脉冲，已在块状熔融石英内部引起了折射率变化。通过相对于激光束的焦点扫描玻璃，已经在玻璃内部制造了波导。折射率变化估计为〜10〜（-4）。还制造了其他更复杂的三维结构（弯曲的波导，分离器和干涉仪）。我们还报道了使用共聚焦显微镜设置的fs改性熔融石英的荧光光谱。使用488 nm激发源，从改性玻璃中观察到630 nm的荧光，这归因于fs脉冲产生的非桥接氧空穴中心（NBOHC）缺陷的存在。长时间暴露在488 nm光下，荧光会衰减，这表明缺陷被激发光光漂白了。

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