首页> 外文会议>Conference on Laser-Assisted Micro- and Nanotechnologies 2003; Jun 29-Jul 3, 2003; St. Petersburg, Russia >Lithographic fabrication of microstructures by laser ablation using femtosecond laser
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Lithographic fabrication of microstructures by laser ablation using femtosecond laser

机译:飞秒激光通过激光烧蚀进行微结构光刻制造

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Photo-lithographical laser ablation was demonstrated by laser ablation using a femtosecond laser system with a lithographic optical system. Among them, laser beam passed through a mask and the pattern was imaged on the film by a pair of convex lenses. As a result, the film was lithographically ablated, and micron-sized patterns were generated in a single shot. Fringes were generated outside the ablated patterns with defocusing or larger laser fluence. The resolution of generation was 13 μm, and the narrowest width of a generated line was about 4 μm. In addition, transmission gratings were used instead of a mask, and nano-sized periodic structures were generated.
机译:使用具有平版印刷光学系统的飞秒激光系统通过激光烧蚀演示了光刻激光烧蚀。其中,激光束穿过掩模,并且图案通过一对凸透镜在胶片上成像。结果,该膜被光刻消融,并且一次拍摄就产生了微米尺寸的图案。在散焦图案外产生散焦或散焦或较大的激光通量。产生的分辨率为13μm,产生的线的最窄宽度为约4μm。另外,使用透射光栅代替掩模,并且产生纳米级的周期性结构。

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