• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Conference on micromachining and microfabrication process technology XIV; 20090127; San Jose, CA(US) >Polymeric Nanosieves Fabricated by UV Lithography
【24h】

Polymeric Nanosieves Fabricated by UV Lithography

机译：紫外光刻技术制备的高分子纳米筛

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Sieves are membranes with a regular array of uniform pores that present low flow resistance. Because of such characteristics they are promising devices for filtration, separation of particles by size and drug delivery control. If the pore dimensions reach the scale of nanometers, new and exciting biological applications may be developed. We propose and demonstrated a technique for fabrication of polymeric sieves using only soft lithography that allows the mass production of sieves with pores in the scale of hundred of nanometers. The technique associates UV interference lithography, conventional optical lithography and molding. The process starts with the UV interference lithography in a thin SU-8 photoresist film, in order to record the small pores. After development, a thick SU-8 layer is coated, on the previously recorded sample, in order to pattern a hexagonal sustaining structure. The structures recorded in SU-8 are used to create a negative mold in PDMS (Polydimethylsiloxane) that is used for casting the sieve in PLLA (poly-L-lactide).
机译：筛子是具有规则排列的均匀孔的膜，具有低流动阻力。由于这些特性，它们是用于过滤，按尺寸分离颗粒和控制药物输送的有前途的装置。如果孔尺寸达到纳米级，则可能会开发出新的令人兴奋的生物学应用。我们提出并证明了仅使用软光刻技术制造聚合物筛的技术，该技术允许大量生产具有百纳米尺度的孔的筛。该技术将紫外线干涉光刻，常规光学光刻和成型技术结合在一起。该过程始于在SU-8光致抗蚀剂薄膜中进行UV干涉光刻，以记录小孔。显影后，将厚厚的SU-8层涂在先前记录的样品上，以形成六边形的维持结构图案。 SU-8中记录的结构用于在PDMS（聚二甲基硅氧烷）中创建负模，该负模用于浇铸PLLA（聚L-丙交酯）中的筛网。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号