• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Conference on Optical Design and Testing; 20071112-15; Beijing(CN) >A novel ellipsometer for measuring thickness of oxide layer on the surface of silicon sphere
【24h】

A novel ellipsometer for measuring thickness of oxide layer on the surface of silicon sphere

机译：一种新型的椭圆仪，用于测量硅球表面的氧化层厚度

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The Avogadro constant NA is used as one of the several possible routes to redefinition of the kilogram in metrology today. Usually in order to accurately determine NA, the volume of a perfect single crystal silicon sphere of nearly 1 kg mass should be measured with a high relative uncertainty, i.e. about 1 × 10~(-8). However, the oxide layer grown on the surface of the silicon sphere causes a remarkable systematic difference between the measured and real diameters. A novel ellipsometer has been developed to determine the thickness of the oxide layer accurately and automatically. The arrangement of this instrument is suitable for measuring the layer on the sphere surface. What's more, the measuring is faster by optimizing the parameters and developing the algorithm of calculating the thickness and refractive index of the oxide layer. The preliminary simulation result has present. Thus, the uncertainty of the diameter measurement caused by the oxide layer can be observably reduced. And the further improving of this ellipsometer is discussed in the end.
机译：Avogadro常数NA被用作当今重新定义千克的几种可能的路线之一。通常，为了准确地确定NA，应该以较高的相对不确定性（即大约1×10〜（-8））测量接近1 kg质量的完美单晶硅球的体积。但是，在硅球表面上生长的氧化层会导致实测直径与实际直径之间出现明显的系统差异。已经开发出新颖的椭圆仪，以精确且自动地确定氧化物层的厚度。该仪器的布置适合于测量球体表面上的层。此外，通过优化参数并开发计算氧化层厚度和折射率的算法，测量速度更快。初步的仿真结果已经呈现。因此，可以明显地减小由氧化物层引起的直径测量的不确定性。最后讨论了椭偏仪的进一步改进。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号