• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Conference on Optical Microlithography XV Pt.2, Mar 5-8, 2002, Santa Clara, USA >Flexible fragmentation rules for next generation OPC -tag prior to fragmentation
【24h】

Flexible fragmentation rules for next generation OPC -tag prior to fragmentation

机译：分段之前的下一代OPC标签的灵活分段规则

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Fragmentation, cutting polygon edge into piecewise of small segments that are later allowed to move individually, has been widely accepted as the work-around methodology in modern model-based optical proximity correction (OPC) tools. As tuning a model-based OPC recipe, most engineers spend much time on the model fitting to make simulated curves a better fit to empirical data (CD measurements). Most failure cases, however, do not result from a model with bad fitting. Instead, it has been frequently found that undesired OPC outcomes were derived from fragmentation process. Tuning fragmentation parameters may not be sufficient to resolve some failure cases since it could be intrinsic issues of the current fragmentation mechanism. An illustrative example is the poor correction of a hammerhead line end, in which current fragmentation mechanisms fail to identify it as a line end and later improper compensation (correction) is installed. Other examples including asymmetric OPC results are frequently found. In the present study, several examples were used to assist the analysis of current fragmentation mechanisms in the aspects of effectiveness and limitations. For the coming 0.1 micron or even more advanced generations of technologies, the role of fragmentation mechanism renders its importance more profoundly. Therefore, more powerful fragmentation mechanism will be one of major factors for the success of OPC process. It is the main goal of this study to propose a new fragmentation mechanism. Edges are tagged specifically according to their environment prior to the process of cutting edge into smaller segments. The pseudo code of the new fragmentation mechanism will be given with detailed descriptions.
机译：片段化将多边形边缘切成小段的分段，然后允许其单独移动，已被广泛用作现代基于模型的光学邻近校正（OPC）工具中的变通方法。在调整基于模型的OPC配方时，大多数工程师在模型拟合上花费大量时间，以使模拟曲线更好地适合经验数据（CD测量）。但是，大多数故障情况并非由拟合不良的模型引起。取而代之的是，经常发现不希望的OPC结果是由分散过程引起的。调整碎片参数可能不足以解决某些故障情况，因为它可能是当前碎片机制的固有问题。一个说明性示例是锤头管线末端的不良校正，其中当前的碎裂机制无法将其识别为管线末端，并且随后安装了不合适的补偿（校正）。经常发现其他示例，包括非对称OPC结果。在本研究中，使用了几个示例来辅助分析有效性和局限性方面的当前碎片化机制。对于即将到来的0.1微米或更先进的技术，碎片化机制的作用使其意义更加深刻。因此，更强大的碎片机制将成为OPC工艺成功的主要因素之一。提出新的碎片化机制是本研究的主要目标。在将边缘切割成较小的片段之前，先根据其环境对边缘进行标记。新的碎片机制的伪代码将给出详细说明。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号