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首页> 外文会议>Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan >A model of coating and drying process for the flat polymer film fabrication
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A model of coating and drying process for the flat polymer film fabrication

机译：平面聚合物薄膜制造的涂布和干燥过程模型

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摘要

Many numerical experiments were done in the case of both a constant diffusion coefficient and a time-variable diffusion coefficient obeying Einstein relation concerning concentration, with the result that we found bumpy structure around the edge of a film depended on a vaporization rate, diffusion coefficients (about solvent and concentration) and intrinsic viscosity. Since results of numerical simulations qualitatively agree with former experimental results, it can be said that this simple model includes intrinsic mechanism of drying process. Future work is to do experiments for verification of above model and compare simulation results with experiments. Standing on this comparison, we will correct and precisely remake the model. Concretely, we will add an effect of decrease of temperature on a surface of liquid film due to vaporization to the model.
机译：服从关于浓度的爱因斯坦关系的恒定扩散系数和随时间变化的扩散系数都进行了许多数值实验，结果发现薄膜边缘周围的凹凸结构取决于汽化速率，扩散系数（关于溶剂和浓度）和特性粘度。由于数值模拟的结果在质量上与以前的实验结果吻合，因此可以说这个简单的模型包含了干燥过程的内在机理。未来的工作是进行实验以验证上述模型并将仿真结果与实验进行比较。站在这种比较的基础上，我们将纠正并精确地重新制作模型。具体地，我们将由于模型的蒸发而增加液膜表面的温度降低的效果。

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