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首页> 外文会议>Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan >Pattern Recognition in the Database of a Mask Layout
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Pattern Recognition in the Database of a Mask Layout

机译：掩膜版图数据库中的图案识别

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摘要

The request of pattern recognition has been frequently brought up by both mask and wafer engineers. Despite of different intentions, pattern recognition is usually the first step of many applications and hence plays a major role to accomplish certain tasks. For the purpose of this work, pattern recognition is defined as searching a specific polygon or a group of particular patterns from a chip layout. Operator scan is truly not an efficient approach of pattern recognition, in particular, for cases with huge design database of advanced semiconductor integrated circuits. Obviously, an automation system of pattern recognition is necessary and benefits the data preparation process. Two categories of pattern recognition are discussed in the present study, "fuzzy search" and "exact match." Each category has its own application, but the searching algorithms could be much different. Details of searching algorithms are given for both categories of pattern recognition. Due to the nature of industrial standard, the scope of the present application is limited to database with GDSⅡ format. Hence, coordinate searching is internally used inside the searching engine.
机译：掩模和晶圆工程师经常提出图案识别的要求。尽管意图不同，但是模式识别通常是许多应用程序的第一步，因此在完成某些任务中起着重要作用。出于这项工作的目的，图案识别被定义为从芯片布局中搜索特定的多边形或一组特定的图案。操作员扫描确实不是一种有效的模式识别方法，尤其是对于具有高级半导体集成电路的庞大设计数据库的情况而言。显然，模式识别的自动化系统是必要的，并且有利于数据准备过程。在本研究中讨论了两类模式识别，即“模糊搜索”和“完全匹配”。每个类别都有其自己的应用程序，但是搜索算法可能有很大不同。两种模式识别都给出了搜索算法的详细信息。由于工业标准的性质，本申请的范围限于GDSⅡ格式的数据库。因此，在搜索引擎内部使用坐标搜索。

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