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首页> 外文会议>Conference on Photon Processing in Microelectronics and Photonics Jan 21-24, 2002 San Jose, USA >Microfabrication by a High Fluence Femtosecond Exposure: Mechanism and Applications
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Microfabrication by a High Fluence Femtosecond Exposure: Mechanism and Applications

机译：高通量飞秒曝光的微细加工：机理与应用

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摘要

We report the observation of 3/2-frequency generation during an Optically-induced failure of silica under femtosecond laser pulse irradiation. The origin of 3/2-frequency generation is due to a two-plasmon decay instability, which occurs at the quarter critical density of free charge carriers. We observed this emission during the optical damaging of glasses by tightly focused (numerical aperture of the objective lens was 0.5-1.35) femtosecond laser pulses. The pulse duration at the irradiation spot was about 0.35 ps, the energy 25-250 nJ, and the damage was recorded in a single shot event inside the glass. The emission at about 530 nm was only present in the spectra measured during an optical damage by 795 nm irradiation with the pulse energy 9 times and more higher than the threshold. We observed a new phenomenon applicable for microstructuring of glass. The high energy fs pulses (50-200 μJ) were focused by a plano-convex lens (focal length 2-10 cm) on the exit surface of a glass plate. The surface was ablated and the ablation was transferred into a volume of glass by translation of a "plasma spark". The length of such a channels can by up to few-cm and with a diameter of tens-of-micrometers. The mechanism and application of high-fluence fs fabrication in dielectrics is discussed.
机译：我们报告在飞秒激光脉冲辐照下光诱导的二氧化硅失效期间的3/2频率生成的观察。 3/2频率产生的起源是由于两等离激元衰变不稳定性，这种不稳定性发生在自由载流子的四分之一临界密度处。我们通过紧密聚焦（物镜的数值孔径为0.5-1.35）飞秒激光脉冲对玻璃进行光学损伤期间观察到了这种发射。照射点处的脉冲持续时间约为0.35 ps，能量为25-250 nJ，并且在玻璃内部的单发事件中记录了损坏。大约530 nm处的发射仅出现在以795 nm脉冲能量的9倍或更高的阈值照射795 nm的光损伤期间测得的光谱中。我们观察到一种适用于玻璃微结构化的新现象。高能fs脉冲（50-200μJ）通过平凸透镜（焦距2-10 cm）聚焦在玻璃板的出射面上。通过“等离子火花”的平移烧蚀表面并将烧蚀转移到一定体积的玻璃中。这样的通道的长度可以长达几厘米，直径可以达到几十微米。讨论了高通量fs制造在电介质中的机理和应用。

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