Glass Micromachining Using the VUV F_2 Laser

机译：使用VUV F_2激光进行玻璃微加工

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Theoretical and experimental studies of the surface quality in 157nm F_2 laser-ablated glasses are reported. Limitations set by statistical fluctuations in the multi-mode beam and by stationary beam non-uniformity are explored together with materials issues such as laser- induced surface cracking. Experimental work on ablating polymethylmethacrylate (PMMA), used as a low threshold medium for recording of the VUV beam, and soda lime glass are described. Use is made of the probe beam deflection technique to determine ablation thresholds, and a variety of methods adopted for characterising and assessing the quality of ablated surfaces e.g. scanning-electron microscopy, mechanical and optical interference profiling and atomic force microscopy. Preliminary roughness measurements are compared with theoretical expectations and the implication for glass micromachining with the F_2 laser discussed.

机译：报道了157nm F_2激光烧蚀玻璃表面质量的理论和实验研究。探讨了由多模光束的统计波动和固定光束的不均匀性所设置的限制，以及诸如激光诱导的表面裂纹之类的材料问题。描述了烧蚀聚甲基丙烯酸甲酯（PMMA）的实验工作，该玻璃用作记录VUV光束的低阈值介质，以及钠钙玻璃。利用探测束偏转技术来确定烧蚀阈值，并采用各种方法来表征和评估烧蚀表面的质量，例如表面粗糙度。扫描电子显微镜，机械和光学干涉图以及原子力显微镜。将初步的粗糙度测量结果与理论预期值进行了比较，并讨论了用F_2激光进行玻璃微加工的意义。

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来源
《Conference on Photon Processing in Microelectronics and Photonics Jan 21-24, 2002 San Jose, USA》|2002年|p.218-227|共10页
会议地点 San Jose CA(US)
作者
Peter E. Dyer; Saher M. Maswadi; Howard V. Snelling; Christopher D. Walton;
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作者单位

Department of Physics, University of HuU, Hull, HU6 7RX, UK;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
VUV; F_2 laser; micromachining; glass; ablation; surface roughness;

机译：VUV; F_2激光;微加工;玻璃;烧蚀;表面粗糙度;

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机译：用于VUV光刻的基于聚（＃alpha＃-甲基-对羟基苯乙烯-甲基丙烯酸丙烯腈）的单层光刻胶：（2）F_2受激准分子激光曝光特性
2. Poly (#alpha#-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F_2 Excimer Laser Exposure Characteristics [J] . Shinji Kishimura, Masaru Sasago, Masamitsu Shirai, Journal of Photopolymer Science and Technology . 2000,第3期

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3. Spectra, temporal structure, and angular directivity of laser radiation of a Yb : YAG crystal and ytterbium glass pumped by low-coherence radiation from a F_2~+ : LiF colour centre laser [J] . Bykovsky NE, Senatsky YV Quantum electronics . 2008,第9期

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4. Glass Micromachining Using the VUV F_2 Laser [C] . Peter E. Dyer, Saher M. Maswadi, Howard V. Snelling, Society of Photo-optical Instrumentation Engineers Europe Conference on Photon Processing in Microelectronics and Photonics . 2002

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Glass Micromachining Using the VUV F_2 Laser

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