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首页> 外文会议>Conference on Recent Developments in Traceable Dimensional Measurements Jun 20-21, 2001, Munich, Germany >Status of the Nanometer Comparator at PTB
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Status of the Nanometer Comparator at PTB

机译：PTB纳米比较器的状态

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摘要

Due to increasing demands on the photolithography of integrated circuits and the progress of interferometric linear encoders, length measurement systems with a reproducibility under 3 nm are used in industry today, whereas the traceability to the unit of length exhibits an uncertainty of about 25 nm. To resolve this problem a new one dimensional length comparator, the nanometer comparator, was developed in a cooperation between the Physikalisch-Technische Bundesanstalt (PTB), the Dr. Johannes Heidenhain GmbH and Werth Meβtechnik GmbH. The nanometer comparator will be able to perform one dimensional calibrations of photomasks, line-graduation scales, incremental linear encoders and laser interferometers in one axis up to a maximum length of 610 mm. To ensure the highest level of measurement performance, the interferometer is completely located in vacuum using metal bellows, whilst the calibration objects can be mounted under atmospheric conditions. The interferometer set-up compensates the dilatation and the bending of the granite base and minimises the measurement circle of the comparator. This in turn will minimise the influence of thermal and mechanical distortions. The interferometer design can be used with a heterodyne or a homodyne signal detection electronics. Due to its high power dissipation, the laser source is arranged far apart from the comparator and light is fed to the interferometers by means of glass fibers. The light source is a frequency-doubled Nd: YAG laser frequency stabilized by an iodine absorption line. Different measuring systems for the structure localization can be attached to an universal sensor carrier on a solid bridge above the measuring carriage. Incremental reading heads and two photoelectric microscopes are now available for this purpose.
机译：由于对集成电路的光刻技术的日益增长的需求以及干涉式线性编码器的发展，如今在工业中使用可再现性低于3 nm的长度测量系统，而以长度为单位的可追溯性则表现出约25 nm的不确定性。为了解决这个问题，在物理技术联合会（PTB），约翰内斯·海德汉博士（Dr. Johannes Heidenhain GmbH）和沃思·迈法技术有限公司（WerthMeβtechnikGmbH）的合作下，开发了一种新型的一维长度比较器，即纳米比较器。纳米比较器将能够在最大长度为610 mm的一轴上对光掩模，线刻度，增量线性编码器和激光干涉仪进行一维校准。为确保最高水平的测量性能，干涉仪完全使用金属波纹管置于真空中，而校准对象可以安装在大气条件下。干涉仪的设置可以补偿花岗岩底座的膨胀和弯曲，并最大程度地减小比较器的测量范围。反过来，这将最小化热和机械变形的影响。干涉仪设计可与外差或零差信号检测电子设备一起使用。由于其高功率耗散，激光源的位置与比较器相距较远，并且通过玻璃纤维将光馈送到干涉仪。光源是通过碘吸收线稳定的Nd：YAG激光倍频。可以将用于结构定位的不同测量系统连接到测量托架上方实心桥上的通用传感器支架上。为此，现在可以使用增量式读数头和两个光电显微镜。

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